{"title":"<i>In situ</i> online deflectometry with synchronized calibration and measurement.","authors":"Ruiyang Wang, Renhao Ge, Daewook Kim, Zekun Zhang, Manwei Chen, Dahai Li, Shouhuan Zhou","doi":"10.1364/OL.562040","DOIUrl":null,"url":null,"abstract":"<p><p>Delicate calibration is essential for high-accuracy deflectometric measurements of specular surfaces. However, traditional methods rely on assumptions that can introduce significant systematic errors, particularly regarding system stability throughout the calibration-measurement process. This Letter proposes a synchronized calibration and measurement method for deflectometry, effectively tackling the instability-induced systematic error. Experimental validation emulating <i>in situ</i> measurement scenario with synchronized calibration has been conducted, and the results demonstrate nanometric-level agreement between interferometry and deflectometry. Our method enables nanometric-level, <i>in situ</i> deflectometry, thereby paving a path to high-accuracy optical fabrication and online surface characterization.</p>","PeriodicalId":19540,"journal":{"name":"Optics letters","volume":"50 12","pages":"3935-3938"},"PeriodicalIF":3.1000,"publicationDate":"2025-06-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Optics letters","FirstCategoryId":"101","ListUrlMain":"https://doi.org/10.1364/OL.562040","RegionNum":2,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"OPTICS","Score":null,"Total":0}
引用次数: 0
Abstract
Delicate calibration is essential for high-accuracy deflectometric measurements of specular surfaces. However, traditional methods rely on assumptions that can introduce significant systematic errors, particularly regarding system stability throughout the calibration-measurement process. This Letter proposes a synchronized calibration and measurement method for deflectometry, effectively tackling the instability-induced systematic error. Experimental validation emulating in situ measurement scenario with synchronized calibration has been conducted, and the results demonstrate nanometric-level agreement between interferometry and deflectometry. Our method enables nanometric-level, in situ deflectometry, thereby paving a path to high-accuracy optical fabrication and online surface characterization.
期刊介绍：
The Optical Society (OSA) publishes high-quality, peer-reviewed articles in its portfolio of journals, which serve the full breadth of the optics and photonics community.
Optics Letters offers rapid dissemination of new results in all areas of optics with short, original, peer-reviewed communications. Optics Letters covers the latest research in optical science, including optical measurements, optical components and devices, atmospheric optics, biomedical optics, Fourier optics, integrated optics, optical processing, optoelectronics, lasers, nonlinear optics, optical storage and holography, optical coherence, polarization, quantum electronics, ultrafast optical phenomena, photonic crystals, and fiber optics. Criteria used in determining acceptability of contributions include newsworthiness to a substantial part of the optics community and the effect of rapid publication on the research of others. This journal, published twice each month, is where readers look for the latest discoveries in optics.
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