Meng Liu , Xiaoqiang Peng , Jie Hu , Yiang Zhang , Chaoliang Guan , Hao Hu , Hongyu Zou , Chunyang Du
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引用次数: 0
Abstract
Complex curved mirrors, featuring high design flexibility, strong aberration-correcting capabilities, and compact structures, are widely utilized in modern optical systems. Currently, ion beam figuring has achieved sub-nanometer precision. However, with the growth in the clear aperture and steepness of mirrors, stringent requirements are set for process conditions and polishing tools, and the correction of mid-spatial frequency (MSF) errors using small-sized ion beams faces great challenges. This paper introduces a method for correcting MSF errors using a small-sized ion beam generated by a conical diaphragm, and its geometric design principles are explained with a simulation model. Simulation results show that selecting appropriate geometric dimensions can effectively adjust the processing distance and significantly improve the material removal rate. Using this method, a small-sized ion beam with a full width at half maximum of 1.01 mm and a processing distance of 22.32 mm is obtained, and its peak energy is 29 times that of a traditional flat diaphragm. Finally, the form error of a complex curved mirror with a clear aperture of Φ45–210 mm and a sag difference of 16.9 mm was corrected to 3.55 nm RMS. The proposed method provides theoretical and technical support for the manufacturing of optical components with nanometer-level precision.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.