Ali Barkhordari, Şemsettin Altındal, Süleyman Özçelik, Hamid Reza Mashayekhi, Mustafa Muradov, Yashar Azizian-Kalandaragh
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引用次数: 0
Abstract
In this work, the optoelectronic response of Al/p-Si photodiodes (PDs) with and without (PVP:Gr-ZnTiO3) composite interlayer is investigated in dark and under various light intensities (P). The manufacturing/surface preparation is thoroughly explained. The electric/optic parameters including leakage/saturation current (I0), series/shunt resistances (Rs/Rsh), barrier height (BH), ideality factor (n), energy-dependent density distribution of surface/interface levels (Nss), photoinduced current (Iph), photosensitivity (S), optical responsivity (R), and specific detectivity (D*) are calculated from the I–V data in dark and under illumination intensities. Raising the light intensity results in a drop in ΦB0 and Rs quantities while increasing the I0 and n values due to photogenerated electron–hole pairs under illumination. The ΦB0-P and ΦB0-n graphs are used to calculate the illumination factor and the ΦB0 in the ideal form. An acceptable linear behavior appears in the Iph–P profiles for the negative-bias region, where the illumination dependence of photocurrent is explored. It is found that the (PVP:Gr-ZnTiO3) interlayer leads to an increase in the S, R, and D* values of the PD to ≈1200, 400 mA W−1, and 1.14 × 1014 Jones, respectively. These results show that the used (PVP:ZnTiO3) interlayer displays an excellent photoresponse and may effectively replace conventional PDs for applications in optoelectronic and photovoltaic devices.
本文研究了Al/ P - si光电二极管(pd)在黑暗和不同光强(P)下的光电响应,以及不含PVP:Gr-ZnTiO3复合中间层。详细解释了制造/表面准备。电学/光学参数包括泄漏/饱和电流(I0)、串联/分流电阻(Rs/Rsh)、势垒高度(BH)、理想因子(n)、表面/界面能级的能量依赖密度分布(Nss)、光感应电流(Iph)、光敏度(S)、光学响应度(R)和比探测率(D*)。提高光强导致ΦB0和Rs量下降,而I0和n值增加,这是由于光照下产生的电子-空穴对。ΦB0-P和ΦB0-n图形用于计算理想形式下的光照因子和ΦB0。可接受的线性行为出现在负偏置区域的iphp剖面中,其中光电流的照明依赖性被探索。结果表明,(PVP:Gr-ZnTiO3)夹层使PD的S、R和D*值分别增加到约1200、400 mA W−1和1.14 × 1014 Jones。这些结果表明,所使用的(PVP:ZnTiO3)中间层具有优异的光响应性能,可以有效地取代传统的pd,用于光电和光伏器件。