The Impact of Temperature Variations on the Electrical Performance of SOI FinFET Devices

IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Haifa Bahri, Rached Ben Mehrez, Faouzi Nasri, Lilia El Amraoui, Nejeh Jaba
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引用次数: 0

Abstract

The temperature-dependent self-heating effect (SHE) is critical for both accurate modeling and selecting optimal operating conditions, as elevated temperatures can compromise device reliability. These days, technology trends toward the miniaturization of electronic devices. As a result, device size decreases, and the packing density of a circuit at the integrated level increases. The combination of these two trends leads to an increase in power density and circuit temperature. For these reasons, our work aims to develop an electrothermal simulation of 20-nm SOI-FinFET. To rigorously analyze electrical behavior, we developed a mathematical framework integrating the ballistic-diffusive equation (BDE). The proposed model is validated by comparing simulated IDS-VGS characteristics with experimental data, demonstrating strong agreement. The SHE is related to thermal design, which is considered a basic procedure in modern microelectronics technology, measuring devices, and a series of modeling simulations and computer analysis of devices. “OFF” is not totally “OFF,” we have demonstrated the evolution of OFF-current (Ioff) with device temperature and the impact of temperature in 20-nm SOI-FinFET on the subthreshold swing (SS) with both VGS = 0.8 V and VDS = 0.8 V.

温度变化对SOI FinFET器件电性能的影响
温度相关的自热效应(SHE)对于精确建模和选择最佳操作条件至关重要,因为升高的温度会损害设备的可靠性。如今,技术趋向于电子设备的小型化。因此,器件尺寸减小,集成级电路的封装密度增加。这两种趋势的结合导致功率密度和电路温度的增加。基于这些原因,我们的工作旨在开发20纳米SOI-FinFET的电热模拟。为了严格分析电行为,我们开发了一个集成弹道扩散方程(BDE)的数学框架。通过将模拟的IDS-VGS特征与实验数据进行比较,验证了该模型的正确性。SHE与热设计有关,热设计被认为是现代微电子技术、测量设备以及设备的一系列建模仿真和计算机分析的基本程序。“OFF”并非完全“OFF”,我们已经演示了OFF电流(Ioff)随器件温度的演变,以及在VGS = 0.8 V和VDS = 0.8 V时,20 nm SOI-FinFET中温度对亚阈值摆幅(SS)的影响。
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来源期刊
CiteScore
4.60
自引率
6.20%
发文量
101
审稿时长
>12 weeks
期刊介绍: Prediction through modelling forms the basis of engineering design. The computational power at the fingertips of the professional engineer is increasing enormously and techniques for computer simulation are changing rapidly. Engineers need models which relate to their design area and which are adaptable to new design concepts. They also need efficient and friendly ways of presenting, viewing and transmitting the data associated with their models. The International Journal of Numerical Modelling: Electronic Networks, Devices and Fields provides a communication vehicle for numerical modelling methods and data preparation methods associated with electrical and electronic circuits and fields. It concentrates on numerical modelling rather than abstract numerical mathematics. Contributions on numerical modelling will cover the entire subject of electrical and electronic engineering. They will range from electrical distribution networks to integrated circuits on VLSI design, and from static electric and magnetic fields through microwaves to optical design. They will also include the use of electrical networks as a modelling medium.
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