{"title":"High-Gain Integrated Complementary Inverters Using Doping-Free MoTe2 Transistors","authors":"Weihan Xu, Huicong Li, Yipei Xie, Miaojin Jiang, Erjuan Guo, Tianyou Zhai","doi":"10.1002/adfm.202509428","DOIUrl":null,"url":null,"abstract":"Two-dimensional (2D) semiconductors have been used in pseudo complementary metal-oxide-semiconductor (CMOS) inverters due to their superior transistor performance. However, technological incompatibilities of 2D materials hinder the integration of complementary circuits, resulting in low gain and limited performance. This study presents a simple, doping-free method for integrating a complementary inverter array on a MoTe<sub>2</sub> active layer, enabling seamless integration of both n-type and p-type transistors. The doping-free MoTe<sub>2</sub> complementary inverter array performs robust logical operations with excellent uniformity. The p-type MoTe<sub>2</sub> transistor in the array achieves an impressive switching ratio of >10<sup>7</sup> and carrier mobility of 22.6 cm<sup>2</sup>V<sup>−1</sup>s<sup>−1</sup>. A maximum high gain of 11 at <i>V</i><sub>DD</sub> = 5 V is achieved for the inverters with SiO<sub>2</sub> as dielectric. Further integration of a hexagonal boron nitride dielectric enhances electrostatic control, resulting in a record-high voltage gain over 300 at <i>V</i><sub>DD</sub> = 4 V. This work not only advances the integration of high-performance logic circuits on 2D materials but also paves the way for future applications in next-generation 2D electronic devices.","PeriodicalId":112,"journal":{"name":"Advanced Functional Materials","volume":"90 1","pages":""},"PeriodicalIF":18.5000,"publicationDate":"2025-06-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Advanced Functional Materials","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1002/adfm.202509428","RegionNum":1,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Two-dimensional (2D) semiconductors have been used in pseudo complementary metal-oxide-semiconductor (CMOS) inverters due to their superior transistor performance. However, technological incompatibilities of 2D materials hinder the integration of complementary circuits, resulting in low gain and limited performance. This study presents a simple, doping-free method for integrating a complementary inverter array on a MoTe2 active layer, enabling seamless integration of both n-type and p-type transistors. The doping-free MoTe2 complementary inverter array performs robust logical operations with excellent uniformity. The p-type MoTe2 transistor in the array achieves an impressive switching ratio of >107 and carrier mobility of 22.6 cm2V−1s−1. A maximum high gain of 11 at VDD = 5 V is achieved for the inverters with SiO2 as dielectric. Further integration of a hexagonal boron nitride dielectric enhances electrostatic control, resulting in a record-high voltage gain over 300 at VDD = 4 V. This work not only advances the integration of high-performance logic circuits on 2D materials but also paves the way for future applications in next-generation 2D electronic devices.
期刊介绍:
Firmly established as a top-tier materials science journal, Advanced Functional Materials reports breakthrough research in all aspects of materials science, including nanotechnology, chemistry, physics, and biology every week.
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