Fei Ni , Shuxin Shen , Tianle Cao, Guangli Yu, Zhiqi Zhu, Kangjun Wang
{"title":"Covalent binding of amines to hierarchically porous MOFs for enhanced arsenic removal","authors":"Fei Ni , Shuxin Shen , Tianle Cao, Guangli Yu, Zhiqi Zhu, Kangjun Wang","doi":"10.1016/j.seppur.2025.133913","DOIUrl":null,"url":null,"abstract":"<div><div>Arsenite (As(III)) threatens to environmental sustainability and human health due to its high mobility and toxic nature. Metal-organic frameworks (MOFs) have gained attention as effective adsorbents for removing As from wastewater systems. Nevertheless, their practical implementation is frequently hindered by several challenges, including inadequate functional stability and insufficient availability of binding sites. In this study, four innovative functionalized adsorbents were developed by covalently grafting ethylenediamine (ED), diethylenetriamine (DETA), tris(2-aminoethyl)amine (TAEA), and polyethyleneimine (PEI) onto the hierarchically structured UiO-66-NH<sub>2</sub> (referred to as HP-UiO-66-NH<sub>2</sub>) through a bromoacetyl bromide-assisted reaction. The creation of hierarchical pores in the MOFs not only enabled the accommodation of amine groups but also enhanced the mass transfer of As(III). Notably, the DETA/HP-UiO-66-NH<sub>2</sub> material exhibited an exceptional adsorption capacity for As(III), reaching up to 406.5 mg g<sup>−1</sup>, which exceeds the performance of the majority of adsorbents reported thus far. In practical applications, a mere 1 mg of DETA/HP-UiO-66-NH<sub>2</sub> is sufficient to effectively remove trace amounts of As(III), meeting the World Health Organization’s recommended limit for drinking water (< 10 µg L<sup>−1</sup>). Fixed-bed column experiments revealed that this adsorbent could treat approximately 1530 bed volumes of arsenic-laden groundwater, achieving a five-fold improvement over commercially available activated carbon. Additionally, the material possessed considerable anti-interference capacity (85 %-96 % effectiveness relative to the blank control) and high regenerability, retaining 91 % of its adsorption capacity after five cycles. Investigations utilizing SEM, N<sub>2</sub> adsorption, XPS, FT-IR, and DFT calculations substantiated that both physical and chemical adsorption were the principal mechanisms driving the adsorption of As(III). This research provides a versatile methodology for the development of ultrahigh-performance MOF adsorbents aimed at addressing arsenic contamination.</div></div>","PeriodicalId":427,"journal":{"name":"Separation and Purification Technology","volume":"376 ","pages":"Article 133913"},"PeriodicalIF":8.1000,"publicationDate":"2025-06-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Separation and Purification Technology","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S1383586625025109","RegionNum":1,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, CHEMICAL","Score":null,"Total":0}
引用次数: 0
Abstract
Arsenite (As(III)) threatens to environmental sustainability and human health due to its high mobility and toxic nature. Metal-organic frameworks (MOFs) have gained attention as effective adsorbents for removing As from wastewater systems. Nevertheless, their practical implementation is frequently hindered by several challenges, including inadequate functional stability and insufficient availability of binding sites. In this study, four innovative functionalized adsorbents were developed by covalently grafting ethylenediamine (ED), diethylenetriamine (DETA), tris(2-aminoethyl)amine (TAEA), and polyethyleneimine (PEI) onto the hierarchically structured UiO-66-NH2 (referred to as HP-UiO-66-NH2) through a bromoacetyl bromide-assisted reaction. The creation of hierarchical pores in the MOFs not only enabled the accommodation of amine groups but also enhanced the mass transfer of As(III). Notably, the DETA/HP-UiO-66-NH2 material exhibited an exceptional adsorption capacity for As(III), reaching up to 406.5 mg g−1, which exceeds the performance of the majority of adsorbents reported thus far. In practical applications, a mere 1 mg of DETA/HP-UiO-66-NH2 is sufficient to effectively remove trace amounts of As(III), meeting the World Health Organization’s recommended limit for drinking water (< 10 µg L−1). Fixed-bed column experiments revealed that this adsorbent could treat approximately 1530 bed volumes of arsenic-laden groundwater, achieving a five-fold improvement over commercially available activated carbon. Additionally, the material possessed considerable anti-interference capacity (85 %-96 % effectiveness relative to the blank control) and high regenerability, retaining 91 % of its adsorption capacity after five cycles. Investigations utilizing SEM, N2 adsorption, XPS, FT-IR, and DFT calculations substantiated that both physical and chemical adsorption were the principal mechanisms driving the adsorption of As(III). This research provides a versatile methodology for the development of ultrahigh-performance MOF adsorbents aimed at addressing arsenic contamination.
期刊介绍:
Separation and Purification Technology is a premier journal committed to sharing innovative methods for separation and purification in chemical and environmental engineering, encompassing both homogeneous solutions and heterogeneous mixtures. Our scope includes the separation and/or purification of liquids, vapors, and gases, as well as carbon capture and separation techniques. However, it's important to note that methods solely intended for analytical purposes are not within the scope of the journal. Additionally, disciplines such as soil science, polymer science, and metallurgy fall outside the purview of Separation and Purification Technology. Join us in advancing the field of separation and purification methods for sustainable solutions in chemical and environmental engineering.