High Entropy Alloy Thin Films as Efficient Spin-Orbit Torque Sources for Spintronic Memories

IF 27.4 1区 材料科学 Q1 CHEMISTRY, MULTIDISCIPLINARY
Peng Wang, Andrea Migliorini, Yung-Cheng Li, Hakan Deniz, Ilya Kostanovski, Jae-Chun Jeon, Stuart S. P. Parkin
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Abstract

High entropy alloys (HEAs) containing multiple elements are emerging as advanced materials with enhanced functionalities. However, their use for spintronic applications remains elusive. Here, it is demonstrated that iridium based HEAs, grown by magnetron sputtering at room temperature, can be used as spin Hall layers. These films display highly efficient conversion of charge current into spin current. They also allow for the epitaxial growth of magnetic multilayers with perpendicular magnetic anisotropy as well as synthetic antiferromagnets using a ternary RuAlGa antiferromagnetic coupling layer. It is demonstrated that iridium-based HEAs serve as effective sources of spin-orbit torque, as quantified by spin-torque ferromagnetic resonance and harmonic Hall measurements, enabling current-induced magnetization reversal and domain wall motion. The threshold current density for current-induced magnetization switching is found to be as low as ∼10 MA cm−2 with reproducible deterministic switching, and that domain walls in HEA-based racetracks can be driven at speeds of up to 300 m s−1 at a current density of 65 MA cm−2. These results show that HEAs should be considered for high-performance spintronic applications.

Abstract Image

高熵合金薄膜作为自旋电子存储器的有效自旋轨道转矩源
高熵合金(High entropy alloys, HEAs)是一种包含多种元素的高性能材料。然而,它们在自旋电子应用中的应用仍然难以捉摸。本文证明了在室温下磁控溅射生长的铱基HEAs可以用作自旋霍尔层。这些薄膜显示了电荷电流到自旋电流的高效转换。它们还允许具有垂直磁各向异性的磁性多层外延生长,以及使用三元RuAlGa反铁磁耦合层合成反铁磁。研究表明,基于铱的HEAs是自旋轨道转矩的有效来源,可以通过自旋转矩铁磁共振和谐波霍尔测量来量化,从而实现电流诱导的磁化反转和畴壁运动。研究发现,电流感应磁化开关的阈值电流密度低至10 MA cm - 2,具有可重复的确定性开关,并且基于hea的赛道中的畴壁可以在65 MA cm - 2的电流密度下以高达300 m s - 1的速度驱动。这些结果表明HEAs应该被考虑用于高性能自旋电子应用。
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来源期刊
Advanced Materials
Advanced Materials 工程技术-材料科学:综合
CiteScore
43.00
自引率
4.10%
发文量
2182
审稿时长
2 months
期刊介绍: Advanced Materials, one of the world's most prestigious journals and the foundation of the Advanced portfolio, is the home of choice for best-in-class materials science for more than 30 years. Following this fast-growing and interdisciplinary field, we are considering and publishing the most important discoveries on any and all materials from materials scientists, chemists, physicists, engineers as well as health and life scientists and bringing you the latest results and trends in modern materials-related research every week.
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