High-Throughput and Manageable Passivation of Interfacial Imperfections by Functionalized Low-Vapor-Pressure Amines for Efficient Perovskite Solar Cells
IF 8.3 2区 材料科学Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
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引用次数: 0
Abstract
The imperfections in polycrystalline perovskite film negatively affect the photovoltaic performance and stability of corresponding solar cell by acting as a nonradiative recombination center and activating the intrinsic degradation. Herein, a manageable vapor-assisted passivation strategy using functionalized amines with low saturated vapor pressure is devised to efficiently modulate the multiple imperfections on the perovskite surface, including passivation of various defects and transformation of photosensitive PbI2 into robust and favorable one-dimensional (1D) perovskitoids. The reformation of perovskite film optimizes the interfacial structure and electronic quality, thus remarkably diminishing the nonradiative recombination loss. Consequently, the amine vapor-treated perovskite solar cell obtains an exceptional power conversion efficiency of 25.35% along with negligible hysteresis as well as superior thermal and moisture stability. Importantly, this low-cost vapor-assisted passivation strategy is universally adaptable to various perovskite systems and delivers a wide time–temperature operating window with high compatibility in high-throughput passivation of large-area perovskite films. Besides, the appropriate vapor treatment is surprisingly efficacious to repair degraded perovskites, further elucidating the reliability of the proposed strategy in regulating multiscale imperfections and its multiple specific dominances in controllable passivation.
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.