Topological Insulators Boost Ultralow-Power Neuromorphic Spintronics: Advancing Handwritten Digit Recognition with High SOT Efficiency

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Xi Guo, Junwei Zeng, Jijun Yun, Pengxiang Zhao, Yuhan Chang, Wenjie Song, Yalu Zuo, Guoqiang Yu, Hao Wu, Li Xi, Baoshan Cui
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Abstract

Neuromorphic spintronics devices driven by spin–orbit torque (SOT) offer advantages in integration density, durability, and scalability for high-performance artificial intelligence systems. However, the development of ultralow-power neuromorphic computing is hindered by the low SOT efficiency (θSH < 1) in conventional heavy metals. In this work, we demonstrate low-power artificial synapses and neuron devices that simultaneously achieve long-term potentiation/depression and excitatory/inhibitory postsynaptic potential processes with an ultralow activation current density of 1.8 × 105 A/cm2, which is 1–2 orders of magnitude lower than that in traditional heavy metal systems, owing to the exceptional SOT efficiency of (BiSb)2Te3 (θSH = 1.11). Furthermore, an artificial neural network utilizing our low-power synapses and neurons achieved 92.8% accuracy in handwritten digit recognition, highlighting topological insulators as promising candidates for low-power neuromorphic spintronics.

Abstract Image

拓扑绝缘体促进超低功耗神经形态自旋电子学:以高SOT效率推进手写数字识别
由自旋轨道扭矩(SOT)驱动的神经形态自旋电子学器件为高性能人工智能系统提供了集成密度、耐用性和可扩展性方面的优势。然而,超低功耗神经形态计算的发展受到低SOT效率(θSH <;1)常规重金属。在这项工作中,我们展示了低功率人工突触和神经元装置,它们同时实现了长期增强/抑制和兴奋/抑制性突触后电位过程,其超低激活电流密度为1.8 × 105 A/cm2,由于(BiSb)2Te3 (θSH = 1.11)的特殊SOT效率,比传统重金属系统低1-2个数量级。此外,利用我们的低功耗突触和神经元的人工神经网络在手写数字识别中达到了92.8%的准确率,突出了拓扑绝缘体作为低功耗神经形态自旋电子学的有前途的候选者。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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