Low-Drift and High-Sensitivity Perovskite X-ray Detector through Proactive Healing of Bulk Ion Migration

IF 8.3 2区 材料科学 Q1 MATERIALS SCIENCE, MULTIDISCIPLINARY
Pengxiang Wang, Hu Wang, Jie Fu, Hao Dong, Wenqing Zhang, Zijun Gao, Yuchuan Shao
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Abstract

The radiation detection performances of perovskites have significantly outperformed those of many traditional semiconductors. However, achieving high-quality perovskite detectors remains challenging due to bias-induced ion migration. The primary concern is the lack of recovery strategies to promptly heal migrated ions during operation, realizing high device stability and exceptional optoelectronic performance. Herein, we proposed a proactive healing strategy of migrated ions by alternating current voltage (ACV) to achieve a low current drift and high optoelectronic sensitivity. Under the ACV, bulk ion migration can be effectively controlled to maintain the long-term stability of perovskite devices. The as-grown defects would annihilate during the ACV post-treatment, decreasing defect density and improving crystal quality. Therefore, more stable and balanced hole and electron photoresponses are harvested after the ACV post-treatment. The treated MAPbBr3 detector exhibits a low dark current drift (∼10–6 nA cm–1 V–1 s–1) and excellent sensitivity [5.43 × 104 (hole) and 4.78 × 104 (electron) μC Gyair–1 cm–2]. This work not only demonstrates a deep insight into device healing but also provides an effective post-treatment and operation strategy for perovskite detectors.

Abstract Image

主动修复体离子迁移的低漂移高灵敏度钙钛矿x射线探测器
钙钛矿的辐射探测性能明显优于许多传统半导体。然而,由于偏压引起的离子迁移,实现高质量的钙钛矿探测器仍然具有挑战性。主要问题是缺乏恢复策略,以在操作过程中迅速修复迁移离子,实现高器件稳定性和卓越的光电性能。在此,我们提出了一种利用交流电压(ACV)主动修复迁移离子的策略,以实现低电流漂移和高光电灵敏度。在ACV作用下,可以有效控制大块离子迁移,保持钙钛矿器件的长期稳定性。生长缺陷会在ACV后处理过程中消失,从而降低缺陷密度,提高晶体质量。因此,ACV后处理后的空穴和电子光响应更加稳定和平衡。处理后的MAPbBr3探测器具有低暗电流漂移(~ 10-6 nA cm-1 V-1 s-1)和优异的灵敏度[5.43 × 104(空穴)和4.78 × 104(电子)μC Gyair-1 cm-2]。这项工作不仅展示了对器件愈合的深刻见解,而且为钙钛矿探测器提供了有效的后处理和操作策略。
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来源期刊
ACS Applied Materials & Interfaces
ACS Applied Materials & Interfaces 工程技术-材料科学:综合
CiteScore
16.00
自引率
6.30%
发文量
4978
审稿时长
1.8 months
期刊介绍: ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.
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