Error analysis and correction of snapshot phase-shift lateral shear interferometer based on dual quality map guided ellipse fitting

IF 3.5 2区工程技术 Q2 ENGINEERING, MANUFACTURING

Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology Pub Date : 2025-05-31 DOI:10.1016/j.precisioneng.2025.05.025

Siqi Wang , Hang Yuan , Ailing Tian , Bingcai Liu , Hongjun Wang , Xueliang Zhu , Jiaming Su , Bei Zhou , Jinyao Hou , Bo Liu

{"title":"Error analysis and correction of snapshot phase-shift lateral shear interferometer based on dual quality map guided ellipse fitting","authors":"Siqi Wang , Hang Yuan , Ailing Tian , Bingcai Liu , Hongjun Wang , Xueliang Zhu , Jiaming Su , Bei Zhou , Jinyao Hou , Bo Liu","doi":"10.1016/j.precisioneng.2025.05.025","DOIUrl":null,"url":null,"abstract":"<div><div>To enable adjustable sensitivity in lateral shearing interferometry, a tunable snapshot phase-shifting lateral shearing interferometry system based on a liquid crystal polarization grating (SPS-LCPG-LSI) was developed. However, in high-precision surface measurements, system phase-shift errors introduced by the LCPG and the pixelated phase mask (PPM) can significantly affect measurement accuracy. To ensure precision, the sources of various system phase-shift errors in the SPS-LCPG-LSI system were analyzed. A Dual-Quality map-guided (Dual-QMG) ellipse fitting algorithm was developed to correct phase-shift errors under varying error magnitudes and intensity distributions. Simulations and experimental results validated the accuracy and feasibility of the Dual-QMG correction algorithm.</div></div>","PeriodicalId":54589,"journal":{"name":"Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology","volume":"96 ","pages":"Pages 44-54"},"PeriodicalIF":3.5000,"publicationDate":"2025-05-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology","FirstCategoryId":"5","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0141635925001758","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"ENGINEERING, MANUFACTURING","Score":null,"Total":0}

引用次数: 0

Abstract

To enable adjustable sensitivity in lateral shearing interferometry, a tunable snapshot phase-shifting lateral shearing interferometry system based on a liquid crystal polarization grating (SPS-LCPG-LSI) was developed. However, in high-precision surface measurements, system phase-shift errors introduced by the LCPG and the pixelated phase mask (PPM) can significantly affect measurement accuracy. To ensure precision, the sources of various system phase-shift errors in the SPS-LCPG-LSI system were analyzed. A Dual-Quality map-guided (Dual-QMG) ellipse fitting algorithm was developed to correct phase-shift errors under varying error magnitudes and intensity distributions. Simulations and experimental results validated the accuracy and feasibility of the Dual-QMG correction algorithm.

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基于双质量图导椭圆拟合的快照相移横向剪切干涉仪误差分析与校正

为了实现横向剪切干涉测量灵敏度的可调，研制了一种基于液晶偏振光栅（SPS-LCPG-LSI）的可调快照移相横向剪切干涉测量系统。然而，在高精度表面测量中，LCPG和像素化相位掩模（PPM）引入的系统相移误差会显著影响测量精度。为了保证精度，分析了SPS-LCPG-LSI系统中各种系统相移误差的来源。提出了一种双质量地图引导（Dual-QMG）椭圆拟合算法，用于校正不同误差幅度和强度分布下的相移误差。仿真和实验结果验证了双qmg校正算法的准确性和可行性。

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来源期刊

Precision Engineering-Journal of the International Societies for Precision Engineering and Nanotechnology 工程技术-工程：制造

CiteScore

7.40

自引率

5.60%

发文量

177

审稿时长

46 days

期刊介绍： Precision Engineering - Journal of the International Societies for Precision Engineering and Nanotechnology is devoted to the multidisciplinary study and practice of high accuracy engineering, metrology, and manufacturing. The journal takes an integrated approach to all subjects related to research, design, manufacture, performance validation, and application of high precision machines, instruments, and components, including fundamental and applied research and development in manufacturing processes, fabrication technology, and advanced measurement science. The scope includes precision-engineered systems and supporting metrology over the full range of length scales, from atom-based nanotechnology and advanced lithographic technology to large-scale systems, including optical and radio telescopes and macrometrology.