Epitaxial Growth of CaTiO3 Thin Films by Metal Organic Vapor Phase Epitaxy for Potential Applications in Memristive Devices

IF 3.2 2区 化学 Q2 CHEMISTRY, MULTIDISCIPLINARY
Mohamed Abdeldayem*, Chang-Ming Liu, Izaz-Ali Shah, Andreas Fiedler, Detlef Klimm, Martin Albrecht and Jutta Schwarzkopf, 
{"title":"Epitaxial Growth of CaTiO3 Thin Films by Metal Organic Vapor Phase Epitaxy for Potential Applications in Memristive Devices","authors":"Mohamed Abdeldayem*,&nbsp;Chang-Ming Liu,&nbsp;Izaz-Ali Shah,&nbsp;Andreas Fiedler,&nbsp;Detlef Klimm,&nbsp;Martin Albrecht and Jutta Schwarzkopf,&nbsp;","doi":"10.1021/acs.cgd.4c0141210.1021/acs.cgd.4c01412","DOIUrl":null,"url":null,"abstract":"<p >Calcium titanate thin films with high structural quality were grown heteroepitaxially on perovskite oxide substrates using the liquid-delivery spin metal−organic vapor phase epitaxy (MOVPE) technique. To determine the growth window, suitable metal−organic precursors were selected, and their evaporation conditions were established. Initially, the thermal decomposition behavior of the precursors was studied using thermogravimetric analysis, which showed that full pyrolysis at 460 °C is possible for both the Ca and Ti precursors. This enabled the growth of fully strained, stoichiometric CaTiO<sub>3</sub> films on SrTiO<sub>3</sub> and NdGaO<sub>3</sub> substrates, and potentially on other perovskite oxide substrates, within the diffusion-limited regime. The influence of vaporization temperatures, substrate temperature, oxygen-to-argon ratio, and Ca-to-Ti ratio on the structural properties of the CaTiO<sub>3</sub> thin films was investigated using high-resolution X-ray diffraction, atomic force microscopy, and transmission electron microscopy. Structural analysis was ultimately correlated with electrical properties measured via IV curves. Intrinsic resistive switching was observed for stoichiometric and slightly off-stoichiometric CaTiO<sub>3</sub> films grown on SrTiO<sub>3</sub> substrates with ≈2.2% tensile strain. Relative to our previous work on resistive switching in SrTiO<sub>3</sub> (<contrib-group><span>Baki</span></contrib-group> ., <cite><i>Sci. Rep.</i></cite>, <span>2021</span>, <em>11</em> (1), 1−11), the underlying mechanism is discussed in the context of CaTiO<sub>3</sub>. This highlights the potential of CaTiO<sub>3</sub> for technological applications such as resistive random-access memory (ReRAM) and neuromorphic computing.</p>","PeriodicalId":34,"journal":{"name":"Crystal Growth & Design","volume":"25 11","pages":"3654–3664 3654–3664"},"PeriodicalIF":3.2000,"publicationDate":"2025-05-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Crystal Growth & Design","FirstCategoryId":"92","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acs.cgd.4c01412","RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0

Abstract

Calcium titanate thin films with high structural quality were grown heteroepitaxially on perovskite oxide substrates using the liquid-delivery spin metal−organic vapor phase epitaxy (MOVPE) technique. To determine the growth window, suitable metal−organic precursors were selected, and their evaporation conditions were established. Initially, the thermal decomposition behavior of the precursors was studied using thermogravimetric analysis, which showed that full pyrolysis at 460 °C is possible for both the Ca and Ti precursors. This enabled the growth of fully strained, stoichiometric CaTiO3 films on SrTiO3 and NdGaO3 substrates, and potentially on other perovskite oxide substrates, within the diffusion-limited regime. The influence of vaporization temperatures, substrate temperature, oxygen-to-argon ratio, and Ca-to-Ti ratio on the structural properties of the CaTiO3 thin films was investigated using high-resolution X-ray diffraction, atomic force microscopy, and transmission electron microscopy. Structural analysis was ultimately correlated with electrical properties measured via IV curves. Intrinsic resistive switching was observed for stoichiometric and slightly off-stoichiometric CaTiO3 films grown on SrTiO3 substrates with ≈2.2% tensile strain. Relative to our previous work on resistive switching in SrTiO3 (Baki ., Sci. Rep., 2021, 11 (1), 1−11), the underlying mechanism is discussed in the context of CaTiO3. This highlights the potential of CaTiO3 for technological applications such as resistive random-access memory (ReRAM) and neuromorphic computing.

金属有机气相外延生长CaTiO3薄膜在忆阻器件中的潜在应用
采用液体输送自旋金属-有机气相外延(MOVPE)技术在钙钛矿氧化物衬底上外延生长出高结构质量的钛酸钙薄膜。为了确定生长窗口,选择了合适的金属有机前驱体,并建立了它们的蒸发条件。首先,利用热重分析研究了前驱体的热分解行为,结果表明Ca和Ti前驱体都可以在460°C下完全热解。这使得在SrTiO3和NdGaO3衬底上以及其他钙钛矿氧化物衬底上生长完全应变的化学计量CaTiO3薄膜能够在扩散限制范围内生长。采用高分辨率x射线衍射、原子力显微镜和透射电子显微镜研究了蒸发温度、衬底温度、氧氩比和ca ti比对CaTiO3薄膜结构性能的影响。结构分析最终与通过IV曲线测量的电性能相关。在拉伸应变≈2.2%的SrTiO3衬底上生长的CaTiO3薄膜,可以观察到化学计量和略非化学计量的本征电阻开关。相对于我们之前在SrTiO3中电阻开关的研究(Baki ., Sci.)。Rep., 2021, 11(1), 1−11),在CaTiO3的背景下讨论了潜在的机制。这凸显了CaTiO3在电阻式随机存取存储器(ReRAM)和神经形态计算等技术应用方面的潜力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
求助全文
约1分钟内获得全文 求助全文
来源期刊
Crystal Growth & Design
Crystal Growth & Design 化学-材料科学:综合
CiteScore
6.30
自引率
10.50%
发文量
650
审稿时长
1.9 months
期刊介绍: The aim of Crystal Growth & Design is to stimulate crossfertilization of knowledge among scientists and engineers working in the fields of crystal growth, crystal engineering, and the industrial application of crystalline materials. Crystal Growth & Design publishes theoretical and experimental studies of the physical, chemical, and biological phenomena and processes related to the design, growth, and application of crystalline materials. Synergistic approaches originating from different disciplines and technologies and integrating the fields of crystal growth, crystal engineering, intermolecular interactions, and industrial application are encouraged.
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:604180095
Book学术官方微信