Establishment and simulation study of equivalent model for thermal contact resistance in electronic devices

IF 1.9 4区 工程技术 Q3 ENGINEERING, CHEMICAL
Weiqiang Xiao, Xinbo Lu, Ruyu Teng, Qingyi Xu, Jian Wu, Jian Xu, Yufeng Han, Guojun Zhou, Wangcheng Zhan
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Abstract

To accurately determine thermal contact resistance (TCR) for the thermal design of electronic devices, a simplified simulation method is first proposed for calculating thermal contact resistance. First, an equivalent geometric model is established based on actual rough surfaces Then, finite element methods are employed to calculate the thermal contact resistance. The results demonstrate that the proposed equivalent geometric model, containing contact point information, can accurately predict the thermal contact resistance, which has a deviation of 10% with the experimental data. Furthermore, the results revealed that both the contact pressure and the surface roughness of the materials significantly influenced TCR, through adjusting the gap thickness. As the contact pressure increased from 200 to 1400 kPa, the TCR decreased from 6.96 × 10 4 to 4.39 × 10 4 m 2 · ° C · W 1 . The decrease became more gradual at high contact pressure, indicating a nonlinear relationship between pressure and TCR. On the other hand, the surface roughness affected TCR primarily through the equivalent contact point height, that is, the gap thickness between two samples. Moreover, temperature affected TCR mainly through radiative heat transfer, which was dependent on material intrinsic properties. The developed simplified calculation method can efficiently simulate TCR for electronic devices, which not only enhanced the understanding of TCR behaviour but also provided a practical tool for optimizing thermal designs in electronic devices.

电子器件接触热阻等效模型的建立与仿真研究
为了准确确定电子器件热设计中的接触热阻(TCR),提出了一种计算接触热阻的简化仿真方法。首先,基于实际粗糙表面建立等效几何模型,然后采用有限元方法计算接触热阻。结果表明,所建立的等效几何模型包含接触点信息,能较准确地预测接触热阻,与实验数据偏差在10%左右。此外,研究结果表明,材料的接触压力和表面粗糙度通过调节间隙厚度对TCR有显著影响。随着接触压力从200 kPa增加到1400 kPa,TCR由6.96 × 10−4降低到4.39 × 10−4 m2·°c·w−1。在高接触压力下,TCR的下降更为缓慢,表明压力与TCR之间存在非线性关系。另一方面,表面粗糙度主要通过等效接触点高度(即两个样品之间的间隙厚度)影响TCR。此外,温度主要通过辐射传热影响TCR,而辐射传热取决于材料的固有特性。所开发的简化计算方法可以有效地模拟电子器件的热阻,不仅增强了对热阻行为的认识,而且为优化电子器件的热设计提供了实用的工具。
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来源期刊
Canadian Journal of Chemical Engineering
Canadian Journal of Chemical Engineering 工程技术-工程:化工
CiteScore
3.60
自引率
14.30%
发文量
448
审稿时长
3.2 months
期刊介绍: The Canadian Journal of Chemical Engineering (CJChE) publishes original research articles, new theoretical interpretation or experimental findings and critical reviews in the science or industrial practice of chemical and biochemical processes. Preference is given to papers having a clearly indicated scope and applicability in any of the following areas: Fluid mechanics, heat and mass transfer, multiphase flows, separations processes, thermodynamics, process systems engineering, reactors and reaction kinetics, catalysis, interfacial phenomena, electrochemical phenomena, bioengineering, minerals processing and natural products and environmental and energy engineering. Papers that merely describe or present a conventional or routine analysis of existing processes will not be considered.
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