Silicon-based van der Waals heteroepitaxy of PbSe with room-temperature sensitive mid-infrared response

IF 3.5 2区物理与天体物理 Q2 PHYSICS, APPLIED

Applied Physics Letters Pub Date : 2025-05-28 DOI:10.1063/5.0271152

Yu Wan, Jiafeng Hu, Yan Lu, Kangmin Leng, Zhendong Wang, Shengpeng Yuan, Zhe Cheng, Qisheng Wang

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引用次数: 0

Abstract

Silicon integration of non-silicon semiconductors is always challenging due to the serious lattice and thermal expansion mismatch. In this study, we design a silicon-based van der Waals heteroepitaxy of infrared semiconductors through the graphene buffer layer. Through density functional theory calculations, we demonstrate that graphene-modified SiO2 surfaces exhibit a drastic reduction in surface potential and sliding energy compared to unmodified substrates. These properties enable the epitaxial growth of high-quality single-crystal lead selenide (PbSe) on silicon, effectively circumventing conventional substrate-induced constraints. The photoelectric characterization shows that the detector made from the graphene/silicon-based PbSe structure achieves great mid-infrared performance. It has a room-temperature specific detectivity (D*) of up to 1.4 × 109 cm Hz1/2 W−1 and a rapid response time in the microsecond range. Our work offers a scalable pathway to overcome limitations of lattice-matched epitaxy and advance the development of silicon-compatible optoelectronics.

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室温敏感中红外响应的PbSe硅基van der Waals异质外延

由于晶格和热膨胀不匹配严重，非硅半导体的硅集成一直是一个挑战。在这项研究中，我们通过石墨烯缓冲层设计了一种基于硅的红外半导体范德华异质外延。通过密度泛函理论计算，我们证明了石墨烯修饰的SiO2表面与未修饰的衬底相比，表面电位和滑动能显着降低。这些特性使得高质量的硒化铅单晶（PbSe）能够在硅上外延生长，有效地规避了传统衬底诱导的限制。光电表征表明，石墨烯/硅基PbSe结构的探测器具有良好的中红外性能。它具有高达1.4 × 109 cm Hz1/2 W−1的室温比探测率（D*）和微秒范围内的快速响应时间。我们的工作为克服晶格匹配外延的局限性和推进硅兼容光电子学的发展提供了一个可扩展的途径。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Applied Physics Letters 物理-物理：应用

CiteScore

6.40

自引率

10.00%

发文量

1821

审稿时长

1.6 months

期刊介绍： Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.