{"title":"A 3-D simulation model for X-ray path length and yield variation in micro-PIXE analysis of rough surfaces","authors":"Ebrahim Gholami Hatam","doi":"10.1016/j.sab.2025.107238","DOIUrl":null,"url":null,"abstract":"<div><div>A crucial aspect of PIXE/XRF analysis is accurately modeling the behavior of emitted X-rays as they traverse the sample, significantly influencing the intensity and detectability of the X-rays. This study presents a comprehensive simulation program designed to model surface topography and calculate X-ray path lengths in 1-D, 2-D, and 3-D views of samples. The model is applied to Micro-PIXE analysis and integrates key physical parameters, including stopping power, X-ray production cross-section, photon attenuation, and local photon creation to estimate the correct X-ray intensity map. Additionally, the simulation accounts for severe surface roughness, where X-rays may exit and re-enter the sample multiple times along their trajectory toward the spectrometer. The X-ray path length and its effect on the accumulated X-ray yield are calculated on both mathematical surface topography and experimental data obtained from Micro-PIXE using a four-segment silicon drift detector (SDD), revealing a remarkable correlation that underscores the importance of detailed X-ray path length calculations. By demonstrating the impact of path length on the accumulated X-ray yield for rough surfaces of varying microscale, this approach could enhance the accuracy of X-ray intensity predictions, leading to more precise elemental composition analysis in X-ray spectroscopy techniques.</div></div>","PeriodicalId":21890,"journal":{"name":"Spectrochimica Acta Part B: Atomic Spectroscopy","volume":"230 ","pages":"Article 107238"},"PeriodicalIF":3.2000,"publicationDate":"2025-05-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Spectrochimica Acta Part B: Atomic Spectroscopy","FirstCategoryId":"92","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0584854725001235","RegionNum":2,"RegionCategory":"化学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"SPECTROSCOPY","Score":null,"Total":0}
引用次数: 0
Abstract
A crucial aspect of PIXE/XRF analysis is accurately modeling the behavior of emitted X-rays as they traverse the sample, significantly influencing the intensity and detectability of the X-rays. This study presents a comprehensive simulation program designed to model surface topography and calculate X-ray path lengths in 1-D, 2-D, and 3-D views of samples. The model is applied to Micro-PIXE analysis and integrates key physical parameters, including stopping power, X-ray production cross-section, photon attenuation, and local photon creation to estimate the correct X-ray intensity map. Additionally, the simulation accounts for severe surface roughness, where X-rays may exit and re-enter the sample multiple times along their trajectory toward the spectrometer. The X-ray path length and its effect on the accumulated X-ray yield are calculated on both mathematical surface topography and experimental data obtained from Micro-PIXE using a four-segment silicon drift detector (SDD), revealing a remarkable correlation that underscores the importance of detailed X-ray path length calculations. By demonstrating the impact of path length on the accumulated X-ray yield for rough surfaces of varying microscale, this approach could enhance the accuracy of X-ray intensity predictions, leading to more precise elemental composition analysis in X-ray spectroscopy techniques.
期刊介绍:
Spectrochimica Acta Part B: Atomic Spectroscopy, is intended for the rapid publication of both original work and reviews in the following fields:
Atomic Emission (AES), Atomic Absorption (AAS) and Atomic Fluorescence (AFS) spectroscopy;
Mass Spectrometry (MS) for inorganic analysis covering Spark Source (SS-MS), Inductively Coupled Plasma (ICP-MS), Glow Discharge (GD-MS), and Secondary Ion Mass Spectrometry (SIMS).
Laser induced atomic spectroscopy for inorganic analysis, including non-linear optical laser spectroscopy, covering Laser Enhanced Ionization (LEI), Laser Induced Fluorescence (LIF), Resonance Ionization Spectroscopy (RIS) and Resonance Ionization Mass Spectrometry (RIMS); Laser Induced Breakdown Spectroscopy (LIBS); Cavity Ringdown Spectroscopy (CRDS), Laser Ablation Inductively Coupled Plasma Atomic Emission Spectroscopy (LA-ICP-AES) and Laser Ablation Inductively Coupled Plasma Mass Spectrometry (LA-ICP-MS).
X-ray spectrometry, X-ray Optics and Microanalysis, including X-ray fluorescence spectrometry (XRF) and related techniques, in particular Total-reflection X-ray Fluorescence Spectrometry (TXRF), and Synchrotron Radiation-excited Total reflection XRF (SR-TXRF).
Manuscripts dealing with (i) fundamentals, (ii) methodology development, (iii)instrumentation, and (iv) applications, can be submitted for publication.