Utilization of silicon optical coatings for transverse-mode suppression in high-power oxide-confined vertical-cavity surface-emitting lasers

IF 3.5 2区物理与天体物理 Q2 PHYSICS, APPLIED

Applied Physics Letters Pub Date : 2025-05-23 DOI:10.1063/5.0260091

Kevin P. Pikul, Patrick Su, Mark D. Kraman, Benjamin A. Kesler, John M. Dallesasse

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引用次数: 0

Abstract

Engineering of the electric-field standing-wave pattern of oxide-confined vertical-cavity surface-emitting lasers (VCSELs) via a scalable, high-refractive-index silicon optical coating is demonstrated to achieve high-power, single-transverse-mode emission. The electron-beam deposition of a thin silicon film atop a standard VCSEL structure reduces the amplitude of the electric-field standing wave over the quantum well gain region, raising the threshold modal gain. Patterning the coating into the shape of an annulus increases the threshold modal gain in the periphery of the VCSEL aperture overlapping with the higher-order transverse modes while leaving the central region unaffected. This patterning creates a radially dependent threshold modal gain profile, suppressing higher-order modes and encouraging operation in a single-fundamental mode. High-power continuous-wave single-mode emission with an output power of 7.43 mW in 850 nm AlGaAs-based VCSELs with silicon coatings is demonstrated, as well as submillamp threshold currents, thermal rollover delay, and a side-mode suppression ratio exceeding 30 dB for single-fundamental-mode operation at room temperature.

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硅光学涂层在高功率氧化约束垂直腔面发射激光器中横向模抑制的应用

通过可扩展的高折射率硅光学涂层，对氧化受限垂直腔表面发射激光器（VCSELs）的电场驻波模式进行了工程设计，以实现高功率、单横模发射。电子束沉积在标准VCSEL结构上的硅薄膜降低了量子阱增益区域上的电场驻波振幅，提高了阈值模态增益。在与高阶横向模态重叠的VCSEL孔径外围，将涂层绘制成环形增加了阈值模态增益，而不影响中心区域。这种模式创建了一个径向依赖的阈值模态增益曲线，抑制了高阶模态，并鼓励在单基模态中工作。在850 nm硅涂层的algaas基VCSELs中，展示了输出功率为7.43 mW的大功率连续波单模发射，以及亚毫安阈值电流，热翻转延迟和超过30 dB的单基模抑制比在室温下工作。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Applied Physics Letters 物理-物理：应用

CiteScore

6.40

自引率

10.00%

发文量

1821

审稿时长

1.6 months

期刊介绍： Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.