Synthesis and Gamma Irradiation Response of Chalcogenide Perovskite ZnSnS3 Thin Films

IF 2.8 3区 材料科学 Q3 CHEMISTRY, PHYSICAL
Silicon Pub Date : 2025-03-25 DOI:10.1007/s12633-025-03297-5
Saad Aldawood, Syed Mansoor Ali, Hamood Kassim, Mohammad Saleh AlGarawi, Safar Saad AlGamdi, Ahmad Abdulkarim Alsaleh
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Abstract

Stable and Lead-free perovskites have grown to be considered encouraging materials for advanced applications due to their promising properties. In this investigation, we presented the synthesis and characterization of chalcogenides perovskite (ZnSnS3) for the gamma sensing application. The ZnSnS3 thin films that have been deposited following a two-step spin coating protocol have not yet been investigated. The trigonal phase of the polycrystalline nanostructure of the ZnSnS3 has been confirmed using X-ray diffraction (XRD). The optical band gap (2.46 eV) of the prepared film has been computed by reflectance spectroscopy, and wide photoluminescence (PL). The electrical properties were studied using a dark current–voltage (I–V) characteristic. In the forward bias, current values rise with increasing radiation dosage, though the turn-on potential goes down from 4.76 V to 4.11 V. The ideality factor of the ZnSnS3/p-Si-hetero-structure was larger than one. However, the saturation current, series resistance, and barrier height for the prepared hetero-structure alter with gamma radiation dose values due to the variation in the density of defect and charge carrier trapping at the interfacial layer. The overall radiation response of the ZnSnS3/p-Si hetero-structure system has been observed by gamma rays-induced carriers inside the depletion region at the interfaces. The responsivity of the thin films suggested that the prepared hetero-structure can be a potential candidate for radiation sensors and dosimeters.

硫系钙钛矿ZnSnS3薄膜的合成及γ辐射响应
稳定和无铅的钙钛矿由于其具有良好的性能而被认为是先进应用的令人鼓舞的材料。在本研究中,我们介绍了用于伽马传感的硫系钙钛矿(ZnSnS3)的合成和表征。采用两步自旋镀膜工艺制备的ZnSnS3薄膜尚未得到研究。用x射线衍射(XRD)证实了ZnSnS3的多晶纳米结构为三角形相。利用反射光谱和宽光致发光(PL)计算了薄膜的光学带隙(2.46 eV)。电学性能采用暗电流-电压(I-V)特性进行研究。在正向偏压下,随着辐射剂量的增加,电流值上升,但导通电位从4.76 V下降到4.11 V。ZnSnS3/p- si异质结构的理想因子大于1。然而,由于缺陷密度和界面层电荷载流子捕获的变化,所制备的异质结构的饱和电流、串联电阻和势垒高度随着γ辐射剂量的变化而变化。利用γ射线诱导载流子在界面耗尽区观察了ZnSnS3/p-Si异质结构体系的整体辐射响应。薄膜的响应性表明,制备的异质结构薄膜可以作为辐射传感器和剂量计的潜在候选材料。
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来源期刊
Silicon
Silicon CHEMISTRY, PHYSICAL-MATERIALS SCIENCE, MULTIDISCIPLINARY
CiteScore
5.90
自引率
20.60%
发文量
685
审稿时长
>12 weeks
期刊介绍: The journal Silicon is intended to serve all those involved in studying the role of silicon as an enabling element in materials science. There are no restrictions on disciplinary boundaries provided the focus is on silicon-based materials or adds significantly to the understanding of such materials. Accordingly, such contributions are welcome in the areas of inorganic and organic chemistry, physics, biology, engineering, nanoscience, environmental science, electronics and optoelectronics, and modeling and theory. Relevant silicon-based materials include, but are not limited to, semiconductors, polymers, composites, ceramics, glasses, coatings, resins, composites, small molecules, and thin films.
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