Exploring the thermal, mechanical, optical and nonlinear characteristics of triaqua-(4-nitrophenolato)-lithium: a potential semiorganic single crystal for nonlinear optical applications

IF 3.3 3区工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC

Optical and Quantum Electronics Pub Date : 2025-05-24 DOI:10.1007/s11082-025-08250-9

Jyoti, N. Vijayan, Kiran, Divyansh Joshi, Chetan, Sanyam Jain, Geetanjali Sehgal, B. Sridhar

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引用次数: 0

Abstract

A bulk-size semiorganic single crystal of triaqua-(4-nitrophenolato)-lithium (NPLi·3H₂O) was harvested using the slow evaporation solution technique (SEST) under ambient conditions. Good quality NPLi·3H₂O crystal was analyzed using various instrumentation techniques to assess its suitability for different applications. Its crystallographic structure and unit cell dimensions were evaluated through powder X-ray diffraction (PXRD) and single crystal XRD, confirming that it crystallizes in a monoclinic structure with a non-centrosymmetric nature (P_c). The optical properties of NPLi·3H₂O crystal were analyzed using photoluminescence (PL) and UV–Vis spectroscopy. Thermal stability evaluation was conducted by thermogravimetric analysis (TGA) and the activation energy was calculated based on TGA data. Mechanical stability was evaluated using the Vickers microhardness method, revealing a reverse indentation size effect explained by various theoretical models. The third-order nonlinear optical (NLO) characteristics were investigated using the Z-scan technique, and its nonlinear absorption coefficient (NLA) was determined from open-aperture data. The nonlinear analysis suggests that the NPLi·3H₂O crystal could be an excellent candidate for optical limiting applications.

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探索三水-（4-硝基苯酚）-锂的热、力学、光学和非线性特性：一种潜在的非线性光学应用的半有机单晶

在常温条件下，采用慢蒸发溶液技术（SEST）获得了三水-（4-硝基苯酚）-锂（NPLi·3H2O）半有机单晶。利用各种仪器技术对高质量的NPLi·3H2O晶体进行分析，以评估其在不同应用中的适用性。通过粉末x射线衍射（PXRD）和单晶x射线衍射（XRD）对其晶体结构和晶胞尺寸进行了评价，证实其结晶为单斜晶，具有非中心对称性质（Pc）。利用光致发光（PL）和紫外可见光谱分析了NPLi·3H2O晶体的光学性质。采用热重分析（TGA）对其进行热稳定性评价，并根据热重分析数据计算活化能。使用维氏显微硬度法评估了机械稳定性，揭示了各种理论模型解释的反向压痕尺寸效应。利用z扫描技术研究了三阶非线性光学（NLO）特性，并利用开放孔径数据测定了其非线性吸收系数（NLA）。非线性分析表明，NPLi·3H2O晶体可能是光学限制应用的优秀候选者。

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来源期刊

Optical and Quantum Electronics 工程技术-工程：电子与电气

CiteScore

4.60

自引率

20.00%

发文量

810

审稿时长

3.8 months

期刊介绍： Optical and Quantum Electronics provides an international forum for the publication of original research papers, tutorial reviews and letters in such fields as optical physics, optical engineering and optoelectronics. Special issues are published on topics of current interest. Optical and Quantum Electronics is published monthly. It is concerned with the technology and physics of optical systems, components and devices, i.e., with topics such as: optical fibres; semiconductor lasers and LEDs; light detection and imaging devices; nanophotonics; photonic integration and optoelectronic integrated circuits; silicon photonics; displays; optical communications from devices to systems; materials for photonics (e.g. semiconductors, glasses, graphene); the physics and simulation of optical devices and systems; nanotechnologies in photonics (including engineered nano-structures such as photonic crystals, sub-wavelength photonic structures, metamaterials, and plasmonics); advanced quantum and optoelectronic applications (e.g. quantum computing, memory and communications, quantum sensing and quantum dots); photonic sensors and bio-sensors; Terahertz phenomena; non-linear optics and ultrafast phenomena; green photonics.