Salt-assisted promotion of large dimensional growth of Bi2O2Se

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Pingfan Ning , Xiangyu Li , Feifei Lan , Xuerong Li , Yingmin Wang , Hongjuan Cheng , Yujian Wang
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引用次数: 0

Abstract

Bi2O2Se exhibits broader application prospects compared to other two-dimensional materials due to its high electron mobility, optimal band gap and good environmental stability. In this paper, large-area high-quality 2D Bi2O2Se single-crystal nanosheets were synthesized via a NaCl-assisted chemical vapor deposition (CVD) approach. It was found that the addition of a modest amount of NaCl effectively promoted the transverse growth of 2D Bi2O2Se, resulting in larger dimensions. At the same time, the effects of varying NaCl concentrations on the growth of 2D Bi2O2Se were investigated, elucidating the underlying growth mechanisms. Additionally, various halogen salt-assisted growth experiments were conducted to explore the differential effects of distinct halogen salts on the process. The results indicate that the salt-assisted method significantly enhances the growth process, offering novel insights for the large-scale synthesis of 2D Bi2O2Se.
盐辅助促进Bi2O2Se的大尺寸生长
与其他二维材料相比,Bi2O2Se具有较高的电子迁移率、最佳的带隙和良好的环境稳定性,具有更广阔的应用前景。本文采用nacl辅助化学气相沉积(CVD)法制备了大面积高质量的二维Bi2O2Se单晶纳米片。结果表明,适量NaCl的加入能有效促进二维Bi2O2Se的横向生长,使其尺寸增大。同时,研究了不同NaCl浓度对二维Bi2O2Se生长的影响,阐明了其生长机制。此外,还进行了各种卤素盐辅助生长实验,以探索不同卤素盐对该过程的不同影响。结果表明,盐辅助方法显著提高了生长过程,为大规模合成二维Bi2O2Se提供了新的见解。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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