The role of Nitrogen during selenization in enhancing CZTS thin film properties

IF 2.8 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Vishvas Kumar, Udai P. Singh
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引用次数: 0

Abstract

The kesterite (Cu2ZnSn(SSe)4) thin film’s material properties strongly depend on the annealing parameters. The formation of good property kesterite films requires annealing at high temperatures. The properties of the CZTSe films are impacted by changes in the annealing parameters. The two most important annealing parameters are the annealing temperature profile and the annealing environment. The characteristics of the film are impacted by variations in the annealing atmosphere. In order to study the impact of the annealing environment on the CZTSe compound semiconductor, each element of CZTSe was deposited using the thermal deposition technique in a sequence of CuSn, Zn, Se, followed by the annealing process. In the current study, the films were annealed at the same temperature in both the Se and Se + N2 atmospheric conditions to produce the CZTSe compound. The annealing was done in a two-step process. Films were first annealed for 10 min at 230 °C, followed by 10 min at 450 °C. Two different sets of films were fabricated. The paper describes in detail the impact of annealing atmospheres of Se + N2 and Se on the unit cell structure and other characteristics of the CZTSe thin film. It was shown that the CZTS film annealed in Se + N2 atmosphere has improved properties.

硒化过程中氮对提高CZTS薄膜性能的作用
kesterite (Cu2ZnSn(SSe)4)薄膜的材料性能与退火参数有很大关系。性能优良的kesterite薄膜的形成需要在高温下退火。退火参数的变化影响了CZTSe薄膜的性能。两个最重要的退火参数是退火温度分布和退火环境。薄膜的特性受退火气氛的影响。为了研究退火环境对CZTSe化合物半导体的影响,采用热沉积技术按CuSn、Zn、Se的顺序沉积CZTSe的各个元素,然后进行退火处理。在本研究中,在Se和Se + N2两种大气条件下,在相同温度下对薄膜进行退火,以产生CZTSe化合物。退火过程分为两步。薄膜首先在230°C退火10分钟,然后在450°C退火10分钟。制作了两套不同的胶片。本文详细介绍了Se + N2和Se的退火气氛对CZTSe薄膜的单胞结构和其他特性的影响。结果表明,在Se + N2气氛中退火后的CZTS薄膜具有较好的性能。
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来源期刊
Applied Physics A
Applied Physics A 工程技术-材料科学:综合
CiteScore
4.80
自引率
7.40%
发文量
964
审稿时长
38 days
期刊介绍: Applied Physics A publishes experimental and theoretical investigations in applied physics as regular articles, rapid communications, and invited papers. The distinguished 30-member Board of Editors reflects the interdisciplinary approach of the journal and ensures the highest quality of peer review.
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