Study on the wettability, intermetallic compound growth, voids formation and mechanical properties of Cu/Sn joints with changes in substrate roughness for electronic packaging

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Yibo Hu, Jieshi Chen, Yi Zhen, YuZhu Han, Chun Yu, Kai Xiong, Shuye Zhang
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引用次数: 0

Abstract

The study investigates the effects of roughness changes on the wettability, intermetallic compound growth, voids formation, and shear mechanics of Cu/Sn joints by preparing microtextures with different intervals on the Cu surface using femtosecond laser. The study found that the roughness of the substrate increased from 0.03 μm to 0.09 μm ~ 0.16 μm after laser treatment, and the corresponding wetting angle decreased from 49.75° to 30° ~ 40° due to the formation of periodic grooves after ultrafast laser processing, which created energy barriers that reduced the spreading ability and wettability of liquid metal. During the variation of surface roughness, the thickness of the intermetallic compounds (IMCs) is the greatest at the maximum roughness level both before and after thermal ageing. After 168 h of thermal treatment, a significant number of voids are generated at the joint with the maximum roughness. The joint with a roughness of 0.16 μm exhibits the fastest growth rate of IMCs thickness, while the joint with the maximum roughness shows the lowest shear strength. Additionally, as the roughness decreases, the fracture mode transitions from ductile fracture to brittle fracture. The reasons for the aforementioned phenomena are that the changes in roughness lead to variations in nucleation at the interface during the liquid-state process, which in turn affect the diffusion channels at the interface and ultimately cause unbalanced diffusion of copper and tin.

电子封装基底粗糙度变化对Cu/Sn接头润湿性、金属间化合物生长、孔洞形成及力学性能的影响
利用飞秒激光在Cu表面制备不同间隔的微织构,研究了粗糙度变化对Cu/Sn接头润湿性、金属间化合物生长、孔洞形成和剪切力学的影响。研究发现,激光处理后基材的粗糙度从0.03 μm增加到0.09 μm ~ 0.16 μm,相应的润湿角从49.75°减小到30°~ 40°,这是由于超快激光加工后形成的周期性凹槽造成的能量垒垒,降低了液态金属的扩散能力和润湿性。在表面粗糙度变化过程中,热时效前后金属间化合物(IMCs)的厚度在最大粗糙度水平处均最大。热处理168 h后,粗糙度最大的接头处产生了大量空洞。粗糙度为0.16 μm的节理IMCs厚度增长速度最快,而粗糙度最大的节理抗剪强度最低。此外,随着粗糙度的减小,断裂模式从韧性断裂转变为脆性断裂。产生上述现象的原因是,在液相过程中,粗糙度的变化导致界面处的形核发生变化,进而影响界面处的扩散通道,最终导致铜锡扩散不平衡。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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