Ag/Ga2O3/n-Si Schottky-type photodetector for visible light detection

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Mehmet Yilmaz, Adem Kocyigit, Erman Erdogan, Murat Yıldırım, Maria Luisa Grilli
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引用次数: 0

Abstract

Gallium oxide (Ga2O3) is an ultra-wide band gap material which has been receiving increasing interest for its potential applications in power electronics, ultraviolet (UV) photodetectors, and gas sensors. In this study, we have synthesized β-phase Ga2O3 on n-Si substrate using the electrodeposition technique, and investigated its properties for use in photodetector applications for broadband detection combining Si and Ga2O3. X-ray diffractometer (XRD), scanning electron microscope (SEM) with energy dispersive x-ray (EDX) analysis were conducted to illuminate structural and morphological behaviors of the Ga2O3. Ag metallic contacts on the Ga2O3/n-Si junction and Al ohmic contact on the back surface of the n-Si were obtained by thermal evaporation technique. Thus, Ag/Ga2O3/n-Si Schottky-type photodetectors were fabricated and characterized by current–voltage (I-V) measurements depending on various light power intensities and wavelengths ranging from UV to near-infrared (NIR). The diode characteristics, as well as the photodetection parameters such as responsivity, specific detectivity, and external quantum efficiency (EQE) were determined and discussed in detail. The Ag/Ga2O3/n-Si Schottky-type photodetectors showed high performances: 122.88 A/W responsivity, 1.07 × 1012 Jones specific detectivity, and very high EQE value of 2.18 × 104% at 700 nm wavelength. The obtained Ag/Ga2O3/n-Si Schottky-type photodetector exhibits promising potential as a candidate for optoelectronic applications in the visible range. These photodetectors can be used in visible light communication, light sensing and cameras.

用于可见光探测的Ag/Ga2O3/n-Si肖特基型光电探测器
氧化镓(Ga2O3)是一种超宽带隙材料,由于其在电力电子、紫外(UV)光电探测器和气体传感器中的潜在应用而受到越来越多的关注。在这项研究中,我们利用电沉积技术在n-Si衬底上合成了β相Ga2O3,并研究了其用于Si和Ga2O3结合的光电探测器宽带探测的性能。利用x射线衍射仪(XRD)、扫描电镜(SEM)和能量色散x射线(EDX)分析阐明了Ga2O3的结构和形态行为。采用热蒸发技术在Ga2O3/n-Si结上获得了Ag金属接触,在n-Si背表面获得了Al欧姆接触。因此,制备了Ag/Ga2O3/n-Si肖特基型光电探测器,并根据从紫外到近红外(NIR)的各种光功率强度和波长,通过电流-电压(I-V)测量来表征。确定并详细讨论了二极管的特性以及响应率、比探测率和外量子效率等光探测参数。Ag/Ga2O3/n-Si schottky型光电探测器在700 nm波长处具有122.88 A/W的响应率、1.07 × 1012的琼斯比探测率和2.18 × 104%的EQE值。所获得的Ag/Ga2O3/n-Si肖特基型光电探测器在可见光范围内具有广阔的光电应用前景。这些光电探测器可用于可见光通信,光传感和相机。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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