D. I. Brinkevich, E. V. Grinyuk, S. D. Brinkevich, V. S. Prosolovich, Yu. N. Yankovskii, V. V. Kolos, O. A. Zubova, S. B. Lastovskii
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引用次数: 0
Abstract
It was found that radiation-induced processes in films of negative photoresist NFR 016D at doses up to 2 × 1015 cm–2 occur mainly with the participation of residual solvent molecules or on by-products of the photoresist film synthesis. After irradiation, absorption bands with maxima at 1717 (stretching vibrations of C=O bonds), 1068, and 1009 cm–1 (vibrations of C–O–C bond in methyl-3-methoxypropylate solvent) disappear in the attenuated total internal reflection spectra of the photoresist. At irradiation doses above 1 × 1016 cm–2, significant changes in the intensity of the bands associated with the main component of the photoresist (phenol-formaldehyde resin) were observed. A noticeable transformation of the spectrum occurs in the region of 1550–1700 cm–1, in which stretching vibrations of C=O bonds are observed. At irradiation doses above 2 × 1016 cm–2, the intensities of the bands caused by stretching vibrations of CH2 and CH groups decrease (bands with maxima at 2925 and 3012 cm–1, respectively). The experimental results indicate a change in the composition of substituents at the carbon ring and the formation of conjugated double C=O bonds when the photoresistive film is irradiated with electron doses above 2 × 1016 cm–2.
期刊介绍:
Surface Engineering and Applied Electrochemistry is a journal that publishes original and review articles on theory and applications of electroerosion and electrochemical methods for the treatment of materials; physical and chemical methods for the preparation of macro-, micro-, and nanomaterials and their properties; electrical processes in engineering, chemistry, and methods for the processing of biological products and food; and application electromagnetic fields in biological systems.