Radiation-Induced Processes in Electron-Irradiated Films of Negative Phenol-Formaldehyde Photoresist on Silicon

IF 0.9 Q3 Engineering
D. I. Brinkevich, E. V. Grinyuk, S. D. Brinkevich, V. S. Prosolovich, Yu. N. Yankovskii, V. V. Kolos, O. A. Zubova, S. B. Lastovskii
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引用次数: 0

Abstract

It was found that radiation-induced processes in films of negative photoresist NFR 016D at doses up to 2 × 1015 cm–2 occur mainly with the participation of residual solvent molecules or on by-products of the photoresist film synthesis. After irradiation, absorption bands with maxima at 1717 (stretching vibrations of C=O bonds), 1068, and 1009 cm–1 (vibrations of C–O–C bond in methyl-3-methoxypropylate solvent) disappear in the attenuated total internal reflection spectra of the photoresist. At irradiation doses above 1 × 1016 cm–2, significant changes in the intensity of the bands associated with the main component of the photoresist (phenol-formaldehyde resin) were observed. A noticeable transformation of the spectrum occurs in the region of 1550–1700 cm–1, in which stretching vibrations of C=O bonds are observed. At irradiation doses above 2 × 1016 cm–2, the intensities of the bands caused by stretching vibrations of CH2 and CH groups decrease (bands with maxima at 2925 and 3012 cm–1, respectively). The experimental results indicate a change in the composition of substituents at the carbon ring and the formation of conjugated double C=O bonds when the photoresistive film is irradiated with electron doses above 2 × 1016 cm–2.

硅上负性酚醛光刻胶电子辐照膜的辐射诱导过程
研究发现,在2 × 1015 cm-2剂量下,nfr016d负性光刻胶薄膜中的辐射诱导过程主要发生在残余溶剂分子或光刻胶薄膜合成副产物的参与下。辐照后,光致抗蚀剂的全内反射光谱中,在1717 (C=O键的伸缩振动)、1068和1009 cm-1(甲基-3-甲氧基丙酯溶剂中C - O - C键的振动)处最大的吸收带消失。当辐照剂量大于1 × 1016 cm-2时,光刻胶主要成分(酚醛树脂)相关波段的强度发生了显著变化。光谱在1550-1700 cm-1范围内发生了明显的变化,在此范围内可以观察到C=O键的伸缩振动。当辐照剂量大于2 × 1016 cm-2时,CH2和CH基团拉伸振动引起的能带强度减小(能带最大值分别在2925和3012 cm-1处)。实验结果表明,当电子剂量大于2 × 1016 cm-2时,光敏膜碳环上取代基的组成发生了变化,共轭双C=O键的形成。
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来源期刊
Surface Engineering and Applied Electrochemistry
Surface Engineering and Applied Electrochemistry Engineering-Industrial and Manufacturing Engineering
CiteScore
1.60
自引率
22.20%
发文量
54
期刊介绍: Surface Engineering and Applied Electrochemistry is a journal that publishes original and review articles on theory and applications of electroerosion and electrochemical methods for the treatment of materials; physical and chemical methods for the preparation of macro-, micro-, and nanomaterials and their properties; electrical processes in engineering, chemistry, and methods for the processing of biological products and food; and application electromagnetic fields in biological systems.
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