Image drift compensation in scanning electron microscopy facilitated by an external scanning and imaging system

IF 2.2 3区 工程技术 Q1 MICROSCOPY
Ling‘en Liu , Yixu Zhang , Ni Wang , Liang Tang , Chaoyang Yan , Jianli Zhou , Wenjie Gao , Yuefei Zhang , Junxia Lv , Ze Zhang
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引用次数: 0

Abstract

Microstructures significantly influence the physical properties of materials. Characterizing the evolution of materials' microstructures is helpful for exploring the processing techniques and understanding the thermodynamic properties of materials. However, the in-situ experiments based on the scanning electron microscope (SEM) often suffer from non-uniform image drift distortion, which severely interferes with the imaging and characterization. Therefore, in this study, we develop an external scanning and imaging system for dynamic image drift compensation during the in-situ SEM experiments. The drifted image was dynamically corrected to the center of view by changing the path of the electron beams. The proposed method was compared with three conventional image correction methods to validate its effectiveness in two scenarios, i.e., in-situ translation experiment and in-situ heating experiment. The results showed that the image registration technique combined with the electron beam trajectory correction effectively compensated the image drift caused by irregular sample motion. Compared with existing image post-processing methods, we have achieved real-time drift compensation of the images. For the secondary electron (SE) image with a resolution of 1024 × 1024 pixels compensated based on the method proposed in this paper, the maximum pixel loss within the field of view is only 3 pixels. This technology can effectively correct image drift caused by high temperatures during the in-situ progress, thereby helping material characterization.
扫描电子显微镜中的图像漂移补偿是由外部扫描成像系统实现的
微观结构显著影响材料的物理性能。表征材料微观结构的演变有助于探索材料的加工工艺和理解材料的热力学性质。然而,基于扫描电子显微镜(SEM)的原位实验往往存在不均匀的图像漂移畸变,严重干扰了成像和表征。因此,在本研究中,我们开发了一种外部扫描成像系统,用于原位扫描电镜实验过程中的动态图像漂移补偿。通过改变电子束的路径,将漂移图像动态修正到视点中心。通过与三种传统图像校正方法的对比,验证了该方法在原位平移实验和原位加热实验两种场景下的有效性。结果表明,结合电子束轨迹校正的图像配准技术有效地补偿了样品不规则运动引起的图像漂移。与现有的图像后处理方法相比,我们实现了图像的实时漂移补偿。对于分辨率为1024 × 1024像素的二次电子(SE)图像,采用本文方法补偿后,视场内最大像素损失仅为3像素。该技术可以有效地纠正原位过程中高温引起的图像漂移,从而有助于材料表征。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Micron
Micron 工程技术-显微镜技术
CiteScore
4.30
自引率
4.20%
发文量
100
审稿时长
31 days
期刊介绍: Micron is an interdisciplinary forum for all work that involves new applications of microscopy or where advanced microscopy plays a central role. The journal will publish on the design, methods, application, practice or theory of microscopy and microanalysis, including reports on optical, electron-beam, X-ray microtomography, and scanning-probe systems. It also aims at the regular publication of review papers, short communications, as well as thematic issues on contemporary developments in microscopy and microanalysis. The journal embraces original research in which microscopy has contributed significantly to knowledge in biology, life science, nanoscience and nanotechnology, materials science and engineering.
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