Enhanced high-temperature energy storage density in P-type NiOx quantum dots and P(VDF-HFP) composite dielectrics

IF 8.3 1区材料科学 Q1 MATERIALS SCIENCE, COMPOSITES

Composites Science and Technology Pub Date : 2025-05-18 DOI:10.1016/j.compscitech.2025.111230

Cheng Fang , Ziyi Zhang , Jian Wang , Zhanwen Ye , Kaiyuan Li , Luoqi Wu , Xiaobin Feng , Bo Duan , Lijie Dong , Ling Zhou , Zhonghui Shen

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引用次数: 0

Abstract

The harsh application environment poses higher requirements for the operating temperature of dielectric energy storage capacitors. Suppressing carrier transport at high temperatures is a key method to increase the breakdown field strength (E_b) and the operating temperature of dielectrics. In this paper, low-concentration P-type semiconductor nickel oxide quantum dots (NiO_x QDs) were surface modified with polydopamine (PDA) and introduced into the polymer matrix, with the aim to capture hot carriers by constructing hole traps, thereby increasing the high-temperature E_b and energy storage density (U_dis) of the polymer. The results confirmed the efficiency of the strategy. At 90 °C, the E_b of the NiO_x@PDA/P(VDF-HFP) film reached 2242.78 kV/cm, and the U_dis reached 2.94 J/cm³, which were 42.41 % and 164.86 % higher than those of the pure P(VDF-HFP) film. Thermal and mechanical analyses indicated that the enhanced E_b and U_dis were mainly attributed to the restriction of the Poole-Frenkel emission within the dielectrics. Together with the enhanced compatibility of the organic-inorganic composite interface, the macro defects of the composites were further suppressed and electrical properties were further increased. This work offers a straightforward and efficient approach for manufacturing high-temperature energy storage dielectrics.

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提高了P型NiOx量子点和P（VDF-HFP）复合电介质的高温储能密度

恶劣的应用环境对介质储能电容器的工作温度提出了更高的要求。抑制高温载流子输运是提高击穿场强（Eb）和介质工作温度的关键方法。本文采用聚多巴胺（PDA）对低浓度p型半导体氧化镍量子点（NiOx QDs）进行表面修饰，并将其引入到聚合物基体中，通过构建空穴陷阱捕获热载流子，从而提高聚合物的高温Eb和储能密度（Udis）。结果证实了该策略的有效性。在90℃时，NiOx@PDA/P（VDF-HFP）膜的Eb达到2242.78 kV/cm， Udis达到2.94 J/cm3，分别比纯P（VDF-HFP）膜高42.41%和164.86%。热分析和力学分析表明，Eb和Udis的增强主要是由于介质内部的Poole-Frenkel发射受到了限制。随着有机-无机复合界面相容性的增强，复合材料的宏观缺陷得到进一步抑制，电性能得到进一步提高。这项工作为制造高温储能电介质提供了一种简单有效的方法。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Composites Science and Technology 工程技术-材料科学：复合

CiteScore

16.20

自引率

9.90%

发文量

611

审稿时长

33 days

期刊介绍： Composites Science and Technology publishes refereed original articles on the fundamental and applied science of engineering composites. The focus of this journal is on polymeric matrix composites with reinforcements/fillers ranging from nano- to macro-scale. CSTE encourages manuscripts reporting unique, innovative contributions to the physics, chemistry, materials science and applied mechanics aspects of advanced composites. Besides traditional fiber reinforced composites, novel composites with significant potential for engineering applications are encouraged.