Interfacial properties of monolayer PtSe2 FETs: A comparative study of traditional metal and semimetal electrodes

IF 2.5 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Songyang Li, Xu Li, Jingjun Chen, Zelong Ma, Danni Wang, Peisong Lu, Wenjie Chen, Baoan Bian, Xiao Ouyang, Bin Liao
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引用次数: 0

Abstract

In this work, the interfacial properties of field-effect transistors (FETs) based on monolayer PtSe2 are systematically investigated using first principles. Six traditional metals (Sc, In, Ti, Au, Pd, Pt) along with three semimetals (As, Sb, Bi) are chosen as electrodes. At the vertical interface, when traditional metals (Sc, In, Ti, Au, Pd, Pt) are used as electrodes, the PtSe2 is metallized. However, when semimetals (As, Sb, Bi) are used as electrodes, the band gap of PtSe2 is preserved, forming the quasi-ohmic contact. At the lateral interface, traditional metals and semimetals form Schottky contacts with Fermi level pinning factors of 0.24 and 0.79 for the hole Schottky barriers, respectively. Compared to traditional metals, the semimetals demonstrate significant advantages in constructing p-type Schottky contacts and suppressing Fermi level pinning. This study offers theoretical support for the development of high-performance devices based on PtSe2.

单层PtSe2 fet的界面特性:传统金属和半金属电极的比较研究
本文利用第一性原理系统地研究了基于单层PtSe2的场效应晶体管(fet)的界面特性。六种传统金属(Sc、In、Ti、Au、Pd、Pt)和三种半金属(As、Sb、Bi)作为电极。在垂直界面,当使用传统金属(Sc, In, Ti, Au, Pd, Pt)作为电极时,PtSe2被金属化。然而,当使用半金属(As, Sb, Bi)作为电极时,PtSe2的带隙被保留,形成准欧姆接触。在横向界面处,传统金属和半金属形成肖特基接触,孔肖特基势垒的费米能级钉住因子分别为0.24和0.79。与传统金属相比,半金属在构建p型肖特基触点和抑制费米能级钉钉方面表现出显著的优势。本研究为开发基于PtSe2的高性能器件提供了理论支持。
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来源期刊
Applied Physics A
Applied Physics A 工程技术-材料科学:综合
CiteScore
4.80
自引率
7.40%
发文量
964
审稿时长
38 days
期刊介绍: Applied Physics A publishes experimental and theoretical investigations in applied physics as regular articles, rapid communications, and invited papers. The distinguished 30-member Board of Editors reflects the interdisciplinary approach of the journal and ensures the highest quality of peer review.
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