Shiao Wu , Yang Li , Yueming Li , Fuyuan Zheng , Zhongyi Zhao , Xiangqing Kong , Guorui Zhao
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引用次数: 0
Abstract
Preparation Si3N4 ceramics with high hardness and high fracture toughness is a challenge. In this work, Si3N4 ceramics with high hardness (18.35 ± 0.40 GPa) and high fracture toughness (8.54 ± 0.26 MPa m1/2) were obtained by in-situ nitriding of Si and Y powders and hot-press sintering. By controlling Y content, Si3N4 powders with different α-Si3N4 ratios were obtained, which in turn regulated grain size and morphology of Si3N4 ceramics after sintering. Addition of Y introduces Y-Si-O-N crystalline phase into nitrided powder, which transitions to Y2Si2O7 during subsequent sintering. Y2Si2O7 phase reduces bulk hardness but introduces residual stresses at interface, promotes grain elongation, and improves fracture toughness through crack bridging, stretching, and crack deflection mechanisms. In addition, atomic-scale microstructural analysis reveals coherent interfaces were formed between both Si3N4/SiO2/Y2Si2O7 as well as Si3N4/Si2N2O, with crystallographic orientation relationships of (100) Si3N4//(100) SiO2//(−111) Y2Si2O7 and [010] Si3N4//[001] SiO2//[12–1] Y2Si2O7 as well as (100) Si3N4//(020) Si2N2O and [010] Si3N4//[−102] Si2N2O. These in-situ generated coherent interfaces significantly enhance mechanical properties and reliability of samples, ensuring both high hardness and high fracture toughness.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.