{"title":"Reactive species dynamics and bactericidal mechanisms in cold atmospheric pressure plasma with gas admixtures","authors":"Vishakha Bende , Vandan Nagar , P.S.N.S.R. Srikar , Reetesh K. Gangwar , Devendra Bhale , R.L. Bhardwaj , Rajib Kar","doi":"10.1016/j.vacuum.2025.114393","DOIUrl":null,"url":null,"abstract":"<div><div>This study investigates reactive species dynamics in cold atmospheric pressure plasma (CAPP) and bacterial inactivation pathways in <em>Escherichia coli (E.coli)</em> and <em>Staphylococcus aureus (S.aureus)</em> using a Tesla coil-based radiofrequency (10 MHz) plasma jet with four gas compositions: Ar, Ar-O<sub>2</sub>, Ar-N<sub>2</sub>, and Ar-dry air (3:1) at a 10 mm treatment distance. Optical emission spectroscopy identified •OH and OI, while absorption and fluorescence spectroscopy quantified H<sub>2</sub>O<sub>2</sub> and •OH. UV radiation and O<sub>3</sub> were also measured. Electron temperature (T<sub>e</sub>) and density (n<sub>e</sub>) were determined via collisional-radiative modeling and Stark broadening analysis. Pure Ar plasma achieved complete inactivation, whereas gas admixtures, with lower T<sub>e</sub> and n<sub>e</sub>, reduced reactive species production. Despite its thicker peptidoglycan layer, <em>S.aureus</em> was more susceptible than <em>E.coli</em>, likely due to <em>E.coli</em>'s outer membrane limiting radical penetration. Ar-N<sub>2</sub> caused a 3-log reduction in <em>S.aureus</em> but only 2-log in <em>E.coli</em>, while Ar-O<sub>2</sub> and Ar-dry air had minimal effects on <em>E.coli</em> but reduced <em>S.aureus</em> by 1-log and 2-log, respectively. H<sub>2</sub>O<sub>2</sub> and UV played key roles in oxidative stress and DNA damage, with H<sub>2</sub>O<sub>2</sub> facilitating intracellular •OH generation via Fenton reactions. Pure Ar plasma demonstrated strong bactericidal efficiency at 10 mm, driven by long-lived species (H<sub>2</sub>O<sub>2</sub>, UV) essential for contactless treatment.</div></div>","PeriodicalId":23559,"journal":{"name":"Vacuum","volume":"239 ","pages":"Article 114393"},"PeriodicalIF":3.8000,"publicationDate":"2025-05-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Vacuum","FirstCategoryId":"88","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S0042207X25003835","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
This study investigates reactive species dynamics in cold atmospheric pressure plasma (CAPP) and bacterial inactivation pathways in Escherichia coli (E.coli) and Staphylococcus aureus (S.aureus) using a Tesla coil-based radiofrequency (10 MHz) plasma jet with four gas compositions: Ar, Ar-O2, Ar-N2, and Ar-dry air (3:1) at a 10 mm treatment distance. Optical emission spectroscopy identified •OH and OI, while absorption and fluorescence spectroscopy quantified H2O2 and •OH. UV radiation and O3 were also measured. Electron temperature (Te) and density (ne) were determined via collisional-radiative modeling and Stark broadening analysis. Pure Ar plasma achieved complete inactivation, whereas gas admixtures, with lower Te and ne, reduced reactive species production. Despite its thicker peptidoglycan layer, S.aureus was more susceptible than E.coli, likely due to E.coli's outer membrane limiting radical penetration. Ar-N2 caused a 3-log reduction in S.aureus but only 2-log in E.coli, while Ar-O2 and Ar-dry air had minimal effects on E.coli but reduced S.aureus by 1-log and 2-log, respectively. H2O2 and UV played key roles in oxidative stress and DNA damage, with H2O2 facilitating intracellular •OH generation via Fenton reactions. Pure Ar plasma demonstrated strong bactericidal efficiency at 10 mm, driven by long-lived species (H2O2, UV) essential for contactless treatment.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.