{"title":"Multicolor and Polarization-Sensitive Photodetection of α-In2Se3/2H-MoTe2 vdW Heterostructure for Imaging and Optical Communication","authors":"Qiang Zhang, Sheng Ni, Donghai Zhang, Yu Wang, Qichao Xue, Yuying Wang, Jiazhen Zhang, Fengyi Zhu, Changyi Pan, Yuchuan Shao, Changlong Liu, Tao Liang","doi":"10.1021/acsami.5c04228","DOIUrl":null,"url":null,"abstract":"Polarization-sensitive photodetection across multiple wavelengths holds great potential for advanced optoelectronic applications. Traditional polarization photodetectors require complex polarizers and lens system, while emerging van der Waals (vdW) heterojunction photodetectors still face performance limitations. Here, we present a vdW-stacked α-In<sub>2</sub>Se<sub>3</sub>/2H-MoTe<sub>2</sub> heterostructure, enabling multicolor and polarization-sensitive photodetection across the visible and near-infrared (NIR) spectral ranges. A peak responsivity of 3.7 A·W<sup>–1</sup>, specific detectivity of 5.1 × 10<sup>9</sup> Jones, external quantum efficiency of 486%, and response time of ∼6 ms are demonstrated at the NIR wavelength of 940 nm, facilitated by the efficient photocarriers separation within the built-in electric field in the heterostructure region, as confirmed by high-spatial-resolution photocurrent mappings. The polarization sensitivity of the heterostructure, with polarization ratios of 1.40 at 638 nm and 1.07 at 1550 nm is also verified, enabling polarization imaging with a high resolution. Furthermore, the heterostructure photodetector can also act as an optical signal receiver, enabling high-fidelity and encoded optical communication. Leveraging intrinsic material properties and external field-tunability in vdW heterostructures provides a promising pathway for next-generation high-performance and multifunctional photodetectors.","PeriodicalId":5,"journal":{"name":"ACS Applied Materials & Interfaces","volume":"94 1","pages":""},"PeriodicalIF":8.3000,"publicationDate":"2025-05-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Materials & Interfaces","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1021/acsami.5c04228","RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"MATERIALS SCIENCE, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Polarization-sensitive photodetection across multiple wavelengths holds great potential for advanced optoelectronic applications. Traditional polarization photodetectors require complex polarizers and lens system, while emerging van der Waals (vdW) heterojunction photodetectors still face performance limitations. Here, we present a vdW-stacked α-In2Se3/2H-MoTe2 heterostructure, enabling multicolor and polarization-sensitive photodetection across the visible and near-infrared (NIR) spectral ranges. A peak responsivity of 3.7 A·W–1, specific detectivity of 5.1 × 109 Jones, external quantum efficiency of 486%, and response time of ∼6 ms are demonstrated at the NIR wavelength of 940 nm, facilitated by the efficient photocarriers separation within the built-in electric field in the heterostructure region, as confirmed by high-spatial-resolution photocurrent mappings. The polarization sensitivity of the heterostructure, with polarization ratios of 1.40 at 638 nm and 1.07 at 1550 nm is also verified, enabling polarization imaging with a high resolution. Furthermore, the heterostructure photodetector can also act as an optical signal receiver, enabling high-fidelity and encoded optical communication. Leveraging intrinsic material properties and external field-tunability in vdW heterostructures provides a promising pathway for next-generation high-performance and multifunctional photodetectors.
期刊介绍:
ACS Applied Materials & Interfaces is a leading interdisciplinary journal that brings together chemists, engineers, physicists, and biologists to explore the development and utilization of newly-discovered materials and interfacial processes for specific applications. Our journal has experienced remarkable growth since its establishment in 2009, both in terms of the number of articles published and the impact of the research showcased. We are proud to foster a truly global community, with the majority of published articles originating from outside the United States, reflecting the rapid growth of applied research worldwide.