Peng Yu, Tianji Liu, Yuxuan Zhu, Feng Lin, Shuai Yue, Junichi Takahara, Tao Ding, Hongxing Xu, Alexander O. Govorov, Zhiming M. Wang
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引用次数: 0
Abstract
Chiral plasmonic metasurfaces exhibit circular dichroism (CD) and serve as a key tool for chiroptics. However, in the linear optical regime, the CD value remains fixed. Moreover, conventional chiral plasmonic metasurfaces suffer from poor photothermal stability, making it difficult to excite their nonlinear optical properties. Here, we present a refractory plasmonic molybdenum (Mo) metasurface that not only maintains strong chiroptical effects under extreme conditions, withstanding temperatures up to 1100 °C and laser intensities exceeding 12 GW/cm2, but also realizes intensity-dependent tunable CD in the nonlinear optical region due to chiral saturated absorption and chiral reverse saturable absorption. In addition, our metasurface exhibits giant third-harmonic generation. Finally, we demonstrate a proof-of-concept circularly polarized light limiter based on this refractory chiral Mo metasurface.
期刊介绍:
ACS Nano, published monthly, serves as an international forum for comprehensive articles on nanoscience and nanotechnology research at the intersections of chemistry, biology, materials science, physics, and engineering. The journal fosters communication among scientists in these communities, facilitating collaboration, new research opportunities, and advancements through discoveries. ACS Nano covers synthesis, assembly, characterization, theory, and simulation of nanostructures, nanobiotechnology, nanofabrication, methods and tools for nanoscience and nanotechnology, and self- and directed-assembly. Alongside original research articles, it offers thorough reviews, perspectives on cutting-edge research, and discussions envisioning the future of nanoscience and nanotechnology.