Hongchen Meng, Xiaoyuan Wu, Guanfa Zhong, Lang Zhou
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引用次数: 0
Abstract
Growth of intrinsic hydrogenated amorphous silicon (i-a-Si:H) films in silicon heterojunction solar cells employing hot-wire chemical vapor deposition (HWCVD) technology does have cost advantages, yet related studies remain insufficient. To explore the potential of this technology, we investigate the synergistic effects of hydrogen dilution ratio and hot-wire temperature on film structure, passivation, and carrier transport ability in this research. A process optimization method suitable for HWCVD technology has been developed. By identifying the optimal hydrogen dilution ratio corresponding to each hot-wire temperature, combined with the bilayer film structure deposited at low and high hot-wire temperatures, both passivation and carrier transport capability are optimized, achieving a cell efficiency improvement of 0.26%abs.
期刊介绍:
Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology.
In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics.
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