CVD-grown SnS2active layers on AlGaN/GaN HEMT for arsenic (III) ions detection.

IF 2.9 4区 材料科学 Q3 MATERIALS SCIENCE, MULTIDISCIPLINARY
Nipun Sharma, Adarsh Nigam, Jai Mishra, Ashok Kumar, Srinjoy Mitra, Ankur Gupta, Sudhiranjan Tripathy, Mahesh Kumar
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引用次数: 0

Abstract

The pervasive contamination of water sources by the toxic heavy metal arsenic presents a serious threat to human health and ecological systems. This raises the critical need for innovative detection platforms that can detect such contamination at low cost and as part of an onsite, distributed sensor network. In this context, we report an Arsenic (As3+) ion detection system that was fabricated using 2D SnS2functionalized AlGaN/GaN high electron mobility transistor (HEMT). SnS2layers were grown on the HEMT surface by chemical vapor deposition (CVD) which depicts hexagonal oriented nanosheets with crystal edges. The source and drain tri-metal contacts of Au/Cr/Al were fabricated by thermal evaporation using shadow mask. The sensor response was analyzed by measuring the variation in drain to source current of the device after introducing varied concentrations of As3+ions, ranging from 1 ppb to 10 ppm. The observed sensitivity of the device is 0.42μA ppb-1, with a detection limit of 0.90 ppb, and a response time of 3.2 s. Further, real-time data analysis was performed by the integration of the developed sensor with a customized printed circuit board connected with an Arduino Nano 33 Bluetooth Low Energy (BLE) module for data transmission. The concept of growing the SnS2layer as a functionalizing layer by CVD results in quick response, good repeatability, and selectivity thereby eliminating the need for any additional reference electrode. Integration of the developed AlGaN/GaN HEMT sensor with Arduino Nano 33 BLE makes it an ideal candidate for portable heavy metal ion sensing device for onsite detection.

cvd生长的sns2活性层在AlGaN/GaN HEMT上检测砷(III)离子。
有毒重金属砷对水源的普遍污染对人类健康和生态系统构成严重威胁。这就提出了对创新检测平台的迫切需求,这些平台可以以低成本检测此类污染,并作为现场分布式传感器网络的一部分。在此背景下,我们报道了一种使用二维sns2功能化AlGaN/GaN高电子迁移率晶体管(HEMT)制造的砷(As3+)离子检测系统。采用化学气相沉积(CVD)的方法在HEMT表面生长了sns2层,形成了具有晶体边缘的六边形取向纳米片。采用荫罩热蒸发法制备了Au/Cr/Al源、漏三金属触点。在引入不同浓度的As3+离子(从1 ppb到10 ppm)后,通过测量器件漏极到源电流的变化来分析传感器响应。检测灵敏度为0.42μA ppb-1,检测限为0.90 ppb,响应时间为3.2 s。此外,将开发的传感器与定制的印刷电路板集成,并连接Arduino Nano 33蓝牙低功耗(BLE)模块进行数据传输,从而实现实时数据分析。通过CVD将sns2层作为功能化层生长的概念具有快速响应,良好的可重复性和选择性,从而消除了对任何额外参比电极的需要。将开发的AlGaN/GaN HEMT传感器与Arduino Nano 33 BLE集成在一起,使其成为现场检测便携式重金属离子传感设备的理想选择。
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来源期刊
Nanotechnology
Nanotechnology 工程技术-材料科学:综合
CiteScore
7.10
自引率
5.70%
发文量
820
审稿时长
2.5 months
期刊介绍: The journal aims to publish papers at the forefront of nanoscale science and technology and especially those of an interdisciplinary nature. Here, nanotechnology is taken to include the ability to individually address, control, and modify structures, materials and devices with nanometre precision, and the synthesis of such structures into systems of micro- and macroscopic dimensions such as MEMS based devices. It encompasses the understanding of the fundamental physics, chemistry, biology and technology of nanometre-scale objects and how such objects can be used in the areas of computation, sensors, nanostructured materials and nano-biotechnology.
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