A New Approach for Mitigating the effects of temperature and ITCs in GAA TFETs with a vertical tunneling design

IF 3.9 3区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Bokka Jagadeesh Babu , Bhaskara Venkata Jagannadham Doddi
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引用次数: 0

Abstract

This work proposes an innovative vertical tunneling GAA-VTFET design that enhances analog/AC performance by addressing interface trap effects and temperature variations. Integrating a heavily doped n + source pocket with GaP/Si heterojunction, the device achieves improved BTBT (band-to-band tunneling) efficiency, resulting in higher on-current and a reduced subthreshold slope (SS). The fully source surrounding gate structure enables line tunneling, providing enhanced gate control, while a gate-drain underlap and vertical configuration effectively suppress ambipolar and leakage currents, yielding a high on–off current ratio and compact footprint. DC analysis reveals optimal threshold voltage, high on–off ratio, and low SS, while AC performance metrics, including favourable transconductance, cutoff frequency, and gain-bandwidth product, underscore its suitability for RF and high-performance analog applications.
利用垂直隧道设计降低温度和ITCs对GAA tfet影响的新方法
这项工作提出了一种创新的垂直隧道GAA-VTFET设计,通过解决界面陷阱效应和温度变化来提高模拟/交流性能。该器件将高掺杂n +源口袋与GaP/Si异质结集成在一起,实现了更高的带对带隧道效率,从而提高了导通电流和降低了亚阈值斜率(SS)。全源围绕栅极结构实现线路隧道,提供增强的栅极控制,而栅极漏极下搭和垂直配置有效地抑制双极和漏电流,产生高开关电流比和紧凑的占地面积。直流分析揭示了最佳阈值电压、高通断比和低SS,而交流性能指标,包括有利的跨导、截止频率和增益带宽乘积,强调了其对射频和高性能模拟应用的适用性。
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来源期刊
Materials Science and Engineering: B
Materials Science and Engineering: B 工程技术-材料科学:综合
CiteScore
5.60
自引率
2.80%
发文量
481
审稿时长
3.5 months
期刊介绍: The journal provides an international medium for the publication of theoretical and experimental studies and reviews related to the electronic, electrochemical, ionic, magnetic, optical, and biosensing properties of solid state materials in bulk, thin film and particulate forms. Papers dealing with synthesis, processing, characterization, structure, physical properties and computational aspects of nano-crystalline, crystalline, amorphous and glassy forms of ceramics, semiconductors, layered insertion compounds, low-dimensional compounds and systems, fast-ion conductors, polymers and dielectrics are viewed as suitable for publication. Articles focused on nano-structured aspects of these advanced solid-state materials will also be considered suitable.
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