Oxygen plasma induced improvement of contact resistance and mobility of tellurium field-effect transistor

IF 3.6 2区 物理与天体物理 Q2 PHYSICS, APPLIED
Jinwei Hu, Bosen Wang, Xingyun Li, Ming Yuwen, Bo Zhang, Lianying Zhu, Jun Xu, Deyi Fu, Rong Zhang
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引用次数: 0

Abstract

Two-dimensional tellurium (Te) has been intensely studied in recent years due to its outstanding electrical properties and excellent air stability. Simple and effective contact engineering is highly desirable to further improve its device performance. In this work, we demonstrate a simple strategy to largely improve the metal–Te contact quality by forming an ultrathin tellurium oxide layer in the contact region via O2 plasma treatment. The surface oxide doped the underlying Te layers degenerately due to charge transfer, establishing an Ohmic contact between Pd electrode and Te with negative Schottky barrier under flatband condition. This enables Te field-effect transistor to achieve outstanding electronic performance, including a record-low contact resistance of ∼0.16 kΩ·μm and a high field-effect mobility of ∼1015 cm2V−1s−1 (∼3002 cm2V−1s−1) at room temperature (low temperature). The simplicity and CMOS compatibility of O2 plasma treatment make it a promising candidate for applications in Te-based large-scale integrated circuits.
氧等离子体诱导碲场效应晶体管的接触电阻和迁移率的改善
二维碲(Te)由于其优异的电学性能和良好的空气稳定性,近年来受到了广泛的研究。简单有效的接触工程是进一步提高其器件性能的迫切需要。在这项工作中,我们展示了一种简单的策略,通过O2等离子体处理在接触区域形成超薄氧化碲层,从而大大提高金属- te接触质量。由于电荷转移,表面氧化物使Te层发生简并,在平坦带条件下,Pd电极与Te之间建立了具有负肖特基势垒的欧姆接触。这使得场效应晶体管能够实现出色的电子性能,包括在室温(低温)下创纪录的低接触电阻~ 0.16 kΩ·μm和高场效应迁移率~ 1015 cm2V−1s−1 (~ 3002 cm2V−1s−1)。O2等离子体处理的简单性和CMOS兼容性使其在基于te的大规模集成电路中具有很好的应用前景。
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来源期刊
Applied Physics Letters
Applied Physics Letters 物理-物理:应用
CiteScore
6.40
自引率
10.00%
发文量
1821
审稿时长
1.6 months
期刊介绍: Applied Physics Letters (APL) features concise, up-to-date reports on significant new findings in applied physics. Emphasizing rapid dissemination of key data and new physical insights, APL offers prompt publication of new experimental and theoretical papers reporting applications of physics phenomena to all branches of science, engineering, and modern technology. In addition to regular articles, the journal also publishes invited Fast Track, Perspectives, and in-depth Editorials which report on cutting-edge areas in applied physics. APL Perspectives are forward-looking invited letters which highlight recent developments or discoveries. Emphasis is placed on very recent developments, potentially disruptive technologies, open questions and possible solutions. They also include a mini-roadmap detailing where the community should direct efforts in order for the phenomena to be viable for application and the challenges associated with meeting that performance threshold. Perspectives are characterized by personal viewpoints and opinions of recognized experts in the field. Fast Track articles are invited original research articles that report results that are particularly novel and important or provide a significant advancement in an emerging field. Because of the urgency and scientific importance of the work, the peer review process is accelerated. If, during the review process, it becomes apparent that the paper does not meet the Fast Track criterion, it is returned to a normal track.
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