Intersubband absorption at 1.55μm in symmetrical AlInN/GaN/AlInN/GaN/AlInN quantum well structures

IF 3 Q2 PHYSICS, CONDENSED MATTER
Imen Saidi
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引用次数: 0

Abstract

This work provides a theoretical evaluation of the optical absorption associated with the intersuband in a symmetrical AlInN/GaN/AlInN/GaN/AlInN structure grown in a c-plane. The simulation process begins by solving the coupled Schrödinger-Poisson equations taking into account the effect of polarizations. Subsequently, the intersubband optical absorption coefficient derived from the density-matrix formalism is calculated. The effects of the variation of the indium composition in the central AlInN barrier and the employment of planar doping across the different layers in the AlInN/GaN/AlInN/GaN/AlInN structure on the intersubband absorption have been investigated. The analyzed results indicate that:(i) The intensity of the threshold of the absorption coefficient as well as its energetic position are affected by the indium composition and the ionization rate of the impurity. (ii) The adjustment of the indium composition and the planar doping allow the structure to achieve the desired transition that is 1.55μm (i.e.,0.80 eV). The outcome of this work provides new prospects for optical properties associated with intersubband transitions of indium III-nitride structures, highlighting their potential for application in communication.
对称AlInN/GaN/AlInN/GaN/AlInN量子阱结构中1.55μm的子带间吸收
本工作提供了在c平面生长的对称AlInN/GaN/AlInN/GaN/AlInN结构中与亚基间相关的光吸收的理论评价。模拟过程首先求解考虑极化效应的耦合Schrödinger-Poisson方程。然后,计算了由密度-矩阵形式导出的子带间光吸收系数。研究了中心AlInN势垒中铟组成的变化和AlInN/GaN/AlInN/GaN/AlInN结构中不同层间的平面掺杂对子带间吸收的影响。分析结果表明:(1)吸收系数阈值的强度及其能量值受杂质的铟组成和电离速率的影响。(ii)调整铟成分和平面掺杂使结构实现了1.55μm(即0.80 eV)的理想跃迁。这项工作的结果为iii型氮化铟结构的子带间跃迁相关的光学性质提供了新的前景,突出了它们在通信中的应用潜力。
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来源期刊
CiteScore
6.50
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0.00%
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