Ziyang He , Haitao Fan , Hailin Bi , Minggao Xu , Xudi Wang , Jiuzhong Yang
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引用次数: 0
Abstract
The gas filter system exploits the properties of noble gases, which are characterised by minimal absorption below their ionization thresholds and enhanced absorption above these thresholds. This allows the high harmonics of the incident beam in the synchrotron radiation beamline to be absorbed. The gas filter in the article is a differential pumping system that achieves the pressure difference across several orders of magnitude with the differential tubes and vacuum pumps. Co-existence of multiple flow regimes makes it difficult to calculate the internal pressure distribution through conventional theoretical formulae. The article, designed in accordance with the requirements of a mass spectrometry beamline, introduces a novel gas filter and employs a hybrid NS-DSMC (Navier-Stokes and Direct Simulation Monte Carlo) approach to numerically analyze the gas flow within the filter. The results demonstrate that the pressure distribution obtained through the hybrid NS-DSMC method is in good agreement with the experimental data. Additionally, a phenomenon of weak gas beam effect is observed. The formation of the gas beam effect is associated with a large number of collisionless molecules moving at small angles. Furthermore, the gas beam effect will decrease vacuum pump's pumping efficiency in molecular flow regime.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.