Numerical simulation and design of the gas filter system for the Hefei Light Source mass spectrometry beamline

IF 3.8 2区 材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY
Ziyang He , Haitao Fan , Hailin Bi , Minggao Xu , Xudi Wang , Jiuzhong Yang
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引用次数: 0

Abstract

The gas filter system exploits the properties of noble gases, which are characterised by minimal absorption below their ionization thresholds and enhanced absorption above these thresholds. This allows the high harmonics of the incident beam in the synchrotron radiation beamline to be absorbed. The gas filter in the article is a differential pumping system that achieves the pressure difference across several orders of magnitude with the differential tubes and vacuum pumps. Co-existence of multiple flow regimes makes it difficult to calculate the internal pressure distribution through conventional theoretical formulae. The article, designed in accordance with the requirements of a mass spectrometry beamline, introduces a novel gas filter and employs a hybrid NS-DSMC (Navier-Stokes and Direct Simulation Monte Carlo) approach to numerically analyze the gas flow within the filter. The results demonstrate that the pressure distribution obtained through the hybrid NS-DSMC method is in good agreement with the experimental data. Additionally, a phenomenon of weak gas beam effect is observed. The formation of the gas beam effect is associated with a large number of collisionless molecules moving at small angles. Furthermore, the gas beam effect will decrease vacuum pump's pumping efficiency in molecular flow regime.
合肥光源质谱光束线气体过滤系统的数值模拟与设计
气体过滤系统利用稀有气体的特性,其特点是在其电离阈值以下吸收最小,在这些阈值以上吸收增强。这使得同步加速器辐射光束线中入射光束的高谐波被吸收。本文中的气体过滤器是一个差压泵系统,通过差压管和真空泵实现几个数量级的压差。多流型共存使得用传统的理论公式计算内部压力分布变得困难。本文根据质谱光束线的要求设计了一种新型的气体过滤器,并采用NS-DSMC (Navier-Stokes和直接模拟蒙特卡罗)混合方法对过滤器内的气体流动进行了数值分析。结果表明,采用NS-DSMC混合方法得到的压力分布与实验数据吻合较好。此外,还观察到弱气束效应现象。气体束效应的形成与大量以小角度运动的无碰撞分子有关。此外,气体束效应会降低真空泵在分子流状态下的抽气效率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
Vacuum
Vacuum 工程技术-材料科学:综合
CiteScore
6.80
自引率
17.50%
发文量
0
审稿时长
34 days
期刊介绍: Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.
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