Josephson Field Effect Transistors with InAs on Insulator and High Permittivity Gate Dielectrics

IF 4.3 3区 材料科学 Q1 ENGINEERING, ELECTRICAL & ELECTRONIC
Alessandro Paghi*, Laura Borgongino, Sebastiano Battisti, Simone Tortorella, Giacomo Trupiano, Giorgio De Simoni, Elia Strambini, Lucia Sorba and Francesco Giazotto, 
{"title":"Josephson Field Effect Transistors with InAs on Insulator and High Permittivity Gate Dielectrics","authors":"Alessandro Paghi*,&nbsp;Laura Borgongino,&nbsp;Sebastiano Battisti,&nbsp;Simone Tortorella,&nbsp;Giacomo Trupiano,&nbsp;Giorgio De Simoni,&nbsp;Elia Strambini,&nbsp;Lucia Sorba and Francesco Giazotto,&nbsp;","doi":"10.1021/acsaelm.5c0003810.1021/acsaelm.5c00038","DOIUrl":null,"url":null,"abstract":"<p >InAs on Insulator (InAsOI) has been recently demonstrated as a promising platform to develop hybrid semiconducting-superconducting Josephson Junctions (JJs) and Josephson field effect transistors (JoFETs). The InAsOI consists of an InAs epilayer grown onto a cryogenic-electrically insulating InAlAs metamorphic buffer, which allows the electrical decoupling of surface-exposed adjacent devices together with a high critical current density integration. The miniaturization of Si microchips has progressed significantly due to the integration of high permittivity (high-<i>k</i>) gate insulators, allowing an increased gate coupling with the transistor channel with consequent reduced gate operating voltages and leakages. As well as for Si-based FETs, integrating high-<i>k</i> gate insulators with JoFETs promises similar advantages in superconducting electronics. Here, we investigate the gate-tunable electrical properties of InAsOI-based JoFETs featuring different high-<i>k</i> gate insulators, namely, HfO<sub>2</sub> and Al<sub>2</sub>O<sub>3</sub>. We found that both the ungated and gate-tunable electrical properties of JoFETs are strongly dependent on the insulator chosen. With both dielectrics, the JoFETs can entirely suppress the switching current and increase the normal-state resistance by 10–20 times using negative gate voltages. The HfO<sub>2</sub>-JoFETs exhibit improved gate-tunable electrical performance compared to those achieved with Al<sub>2</sub>O<sub>3</sub>-JoFETs, which is related to the higher permittivity of the insulator. Gate-dependent electrical properties of InAsOI-based JoFETs were evaluated in the temperature range from 50 mK to 1 K. As expected, the switching current monotonically decreases with the increase in temperature, while the normal-state resistance remains unchanged until 1 K. Moreover, under the influence of an out-of-plane magnetic field, JoFETs exhibited an unconventional Fraunhofer diffraction pattern, from which an edge-peaked supercurrent density distribution was calculated. The origin of such anomalies is identified in the physics of the JJ edges, either with an increased current density or with a more accurate consideration of nonuniform flux focusing on the superconducting leads.</p>","PeriodicalId":3,"journal":{"name":"ACS Applied Electronic Materials","volume":"7 9","pages":"3756–3764 3756–3764"},"PeriodicalIF":4.3000,"publicationDate":"2025-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"ACS Applied Electronic Materials","FirstCategoryId":"88","ListUrlMain":"https://pubs.acs.org/doi/10.1021/acsaelm.5c00038","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
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Abstract

InAs on Insulator (InAsOI) has been recently demonstrated as a promising platform to develop hybrid semiconducting-superconducting Josephson Junctions (JJs) and Josephson field effect transistors (JoFETs). The InAsOI consists of an InAs epilayer grown onto a cryogenic-electrically insulating InAlAs metamorphic buffer, which allows the electrical decoupling of surface-exposed adjacent devices together with a high critical current density integration. The miniaturization of Si microchips has progressed significantly due to the integration of high permittivity (high-k) gate insulators, allowing an increased gate coupling with the transistor channel with consequent reduced gate operating voltages and leakages. As well as for Si-based FETs, integrating high-k gate insulators with JoFETs promises similar advantages in superconducting electronics. Here, we investigate the gate-tunable electrical properties of InAsOI-based JoFETs featuring different high-k gate insulators, namely, HfO2 and Al2O3. We found that both the ungated and gate-tunable electrical properties of JoFETs are strongly dependent on the insulator chosen. With both dielectrics, the JoFETs can entirely suppress the switching current and increase the normal-state resistance by 10–20 times using negative gate voltages. The HfO2-JoFETs exhibit improved gate-tunable electrical performance compared to those achieved with Al2O3-JoFETs, which is related to the higher permittivity of the insulator. Gate-dependent electrical properties of InAsOI-based JoFETs were evaluated in the temperature range from 50 mK to 1 K. As expected, the switching current monotonically decreases with the increase in temperature, while the normal-state resistance remains unchanged until 1 K. Moreover, under the influence of an out-of-plane magnetic field, JoFETs exhibited an unconventional Fraunhofer diffraction pattern, from which an edge-peaked supercurrent density distribution was calculated. The origin of such anomalies is identified in the physics of the JJ edges, either with an increased current density or with a more accurate consideration of nonuniform flux focusing on the superconducting leads.

Abstract Image

绝缘体和高介电常数栅极电介质上具有InAs的约瑟夫森场效应晶体管
绝缘体上InAs (InAsOI)最近被证明是开发混合半导体-超导约瑟夫森结(JJs)和约瑟夫森场效应晶体管(jofet)的一个有前途的平台。InAsOI由生长在低温电绝缘InAlAs变质缓冲层上的InAs脱皮层组成,该缓冲层允许表面暴露的相邻器件电去耦,同时具有高临界电流密度集成。由于集成了高介电常数(高k)栅极绝缘体,硅微芯片的小型化已经取得了重大进展,从而增加了与晶体管通道的栅极耦合,从而降低了栅极工作电压和泄漏。与硅基fet一样,将高k栅极绝缘体与jofet集成在一起,在超导电子学方面也有类似的优势。在这里,我们研究了采用不同高k栅极绝缘体(即HfO2和Al2O3)的inasoi基jofet的栅极可调谐电学性能。我们发现,非门控和栅极可调谐的jofet的电学特性都强烈依赖于所选择的绝缘体。使用这两种介质,jofet可以完全抑制开关电流,并使用负栅极电压将正常状态电阻提高10-20倍。与al2o3 - jofet相比,hfo2 - jofet具有更好的栅极可调电性能,这与绝缘体的高介电常数有关。在50 mK至1 K的温度范围内,对基于inasoi的jofet的栅极相关电学特性进行了评估。正如预期的那样,开关电流随着温度的升高而单调减小,而正常状态电阻保持不变,直到1 K。此外,在面外磁场的影响下,jofet表现出一种非常规的弗劳恩霍夫衍射图样,由此计算出了边峰超电流密度分布。这种异常的起源是在JJ边缘的物理特性中确定的,要么是电流密度增加,要么是更准确地考虑到聚焦在超导引线上的非均匀通量。
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来源期刊
CiteScore
7.20
自引率
4.30%
发文量
567
期刊介绍: ACS Applied Electronic Materials is an interdisciplinary journal publishing original research covering all aspects of electronic materials. The journal is devoted to reports of new and original experimental and theoretical research of an applied nature that integrate knowledge in the areas of materials science, engineering, optics, physics, and chemistry into important applications of electronic materials. Sample research topics that span the journal's scope are inorganic, organic, ionic and polymeric materials with properties that include conducting, semiconducting, superconducting, insulating, dielectric, magnetic, optoelectronic, piezoelectric, ferroelectric and thermoelectric. Indexed/​Abstracted: Web of Science SCIE Scopus CAS INSPEC Portico
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