On the growth and water oxidation stability of hydrous iridium oxide†

EES catalysis Pub Date : 2025-02-26 DOI:10.1039/D4EY00268G
Matej Zlatar, Xianxian Xie, Carlo Franke, Tomáš Hrbek, Zdeněk Krtouš, Tong Li, Ivan Khalakhan and Serhiy Cherevko
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Abstract

Hydrous iridium oxide (HIROF) is a highly active catalyst for the oxygen evolution reaction (OER) with broad application in pH sensing and charge storage devices. However, the mechanisms driving its growth, as well as the associated iridium dissolution, remain incompletely understood. To address this knowledge gap, we employ online inductively coupled plasma mass spectrometry (ICP-MS) to monitor iridium dissolution from sputtered thin films of varying thicknesses during electrochemical cycling. Complementary techniques, including atom probe tomography (APT), ellipsometry, and X-ray photoelectron spectroscopy (XPS), are used to study oxidation states and interface composition. Our findings reveal a tri-phase interface consisting of metallic iridium, compact anhydrous oxide, and hydrous oxide, where dissolution predominantly occurs at the metal–compact oxide interface, driven by transient processes during cycling. HIROF growth strongly depends on iridium grain size, with smaller grains inhibiting growth due to the accumulation of an inner compact IrO2 layer. This effect is linked to increased oxophilicity, which lowers the reducibility of compact oxide. These insights advance understanding of HIROF growth mechanisms, offering strategies to optimize its performance and stability, particularly in proton exchange membrane water electrolyzers (PEMWEs), where iridium scarcity is critical. Broader implications extend to hydrous oxide formation on other noble and non-noble metals, potentially further advancing other electrochemical applications.

水合氧化铱†的生长和水氧化稳定性
水合氧化铱(HIROF)是一种高活性的析氧反应催化剂,在pH传感和电荷存储器件中有着广泛的应用。然而,驱动其生长的机制,以及相关的铱溶解,仍然不完全清楚。为了解决这一知识差距,我们采用在线电感耦合等离子体质谱(ICP-MS)来监测电化学循环过程中不同厚度溅射薄膜中铱的溶解。互补技术,包括原子探针断层扫描(APT)、椭偏仪和x射线光电子能谱(XPS),用于研究氧化态和界面组成。我们的发现揭示了一个由金属铱、致密无水氧化物和有水氧化物组成的三相界面,其中溶解主要发生在金属-致密氧化物界面,由循环过程中的瞬态过程驱动。HIROF的生长强烈依赖于铱的晶粒尺寸,较小的晶粒由于内部致密的IrO2层的积累而抑制了生长。这种效果与增加的亲氧性有关,这降低了致密氧化物的还原性。这些见解促进了对HIROF生长机制的理解,提供了优化其性能和稳定性的策略,特别是在质子交换膜水电解槽(PEMWEs)中,铱的稀缺性至关重要。更广泛的影响延伸到其他贵金属和非贵金属的含水氧化物形成,潜在地进一步推进其他电化学应用。
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