{"title":"Atomically precise yet rapid micromachining via projection-based femtosecond laser ablation","authors":"Rugile Zilenaite, Harnjoo Kim, Sourabh K. Saha","doi":"10.1016/j.mfglet.2025.03.003","DOIUrl":null,"url":null,"abstract":"<div><div>It is extremely challenging to achieve atomic scale depth resolutions with top-down micromachining techniques while simultaneously achieving high processing rates. Here, we have overcome this challenge by projecting patterned light sheets of spatio-temporally focused femtosecond laser. It has enabled ablation-based micromachining of thin gold films with depths of cut between 7–14 nm, depth resolvability of 1–3 atoms, and linewidths smaller than 500 nm. Furthermore, we have achieved a processing rate of 9 mm<sup>2</sup>/s, which is 10–10<sup>5</sup> times faster than the state-of-art. Thus, our process enables rapid and atomically precise machining of metal thin films.</div></div>","PeriodicalId":38186,"journal":{"name":"Manufacturing Letters","volume":"44 ","pages":"Pages 18-22"},"PeriodicalIF":1.9000,"publicationDate":"2025-05-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Manufacturing Letters","FirstCategoryId":"1085","ListUrlMain":"https://www.sciencedirect.com/science/article/pii/S221384632500015X","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, MANUFACTURING","Score":null,"Total":0}
引用次数: 0
Abstract
It is extremely challenging to achieve atomic scale depth resolutions with top-down micromachining techniques while simultaneously achieving high processing rates. Here, we have overcome this challenge by projecting patterned light sheets of spatio-temporally focused femtosecond laser. It has enabled ablation-based micromachining of thin gold films with depths of cut between 7–14 nm, depth resolvability of 1–3 atoms, and linewidths smaller than 500 nm. Furthermore, we have achieved a processing rate of 9 mm2/s, which is 10–105 times faster than the state-of-art. Thus, our process enables rapid and atomically precise machining of metal thin films.