High-precision micro-nano fabrication using two-photon etching and spatial light modulators

Abstract

Dynamic encoding of Spatial Light Modulators (SLM) to achieve patterned light fields for efficient, high-precision, and flexibly controllable fabrication remains a significant challenge. This study introduces a novel approach by integrating the flat-top beam algorithm into the Modified Random Phase Amplitude Filter (MRAF) algorithm. This integration optimizes the initial phase distribution, generating a more uniform flat-top light field while avoiding phase singularities, thereby reducing speckle noise and enhancing the quality of microstructures fabricated via two-photon etching. The fabricated structures were analyzed using a white light interferometer, demonstrating that the improved MRAF algorithm significantly enhances fabrication precision compared to the traditional MRAF algorithm. The proposed method not only improves surface quality but also reduces edge distortion, achieving higher fabrication precision and stability. These results validate the practical feasibility and application potential of the improved method.