Ultrahigh-resolution, high interface contrast ionic homopolymers induced by acid–base mixed electrostatic interactions and nanopattern evolution†

IF 4.1 2区 化学 Q2 POLYMER SCIENCE
Sen Weng , Zhen Lu , Jingyu Cai , Longqiang Xiao , Kairui Wang , Rui Zhao , Xin Fu , Linxi Hou
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引用次数: 0

Abstract

Ultrahigh-resolution polymer materials with good thermal stability and high interface contrast have a wide range of application prospects in photolithography and nanomanufacturing processes. Here, we report a series of comb-like homopolymers based on polystyrene sulfonate imidazolium salts (PSSM-(i)imi), achieving efficient self-assembly under solvent-free conditions and obtaining sub-3 nm hexagonally packed cylinders and sub-4 nm lamellar nanopatterns with high interface contrast. The sulfonic acid groups in the main chain of the homopolymers are connected to imidazole groups containing hydrophobic alkyl side chains through acid–base mixed electrostatic interactions. The electrostatic interactions enhance the incompatibility between the two functional groups, while the alkyl side chain can precisely control the domain spacing and nanostructure of the pattern, regardless of their molecular weight. Through the effect of temperature fields, the thermal stability and spatial orientation of the homopolymer nanostructures were further studied, promoting the practical application of nanopatterned materials.

Abstract Image

由酸碱混合静电相互作用和纳米模式演化诱导的超高分辨率、高界面对比度离子均聚物
超高分辨率高分子材料具有良好的热稳定性和高的界面对比度,在光刻和纳米制造工艺中具有广泛的应用前景。在这里,我们报道了一系列基于聚苯乙烯磺酸咪唑盐(PSSM-(i)imi)的梳状均聚物,在无溶剂条件下实现了高效的自组装,并获得了具有高界面对比度的亚3nm的六边形填充圆柱体和亚4nm的片层纳米图案。均聚物主链上的磺酸基团通过酸碱混合静电相互作用与含有疏水烷基侧链的咪唑基团相连。静电相互作用增强了两个官能团之间的不相容,而烷基侧链可以精确地控制图案的畴间距和纳米结构,而不管它们的分子量如何。通过温度场的影响,进一步研究了均聚物纳米结构的热稳定性和空间取向,促进了纳米图案材料的实际应用。
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来源期刊
Polymer Chemistry
Polymer Chemistry POLYMER SCIENCE-
CiteScore
8.60
自引率
8.70%
发文量
535
审稿时长
1.7 months
期刊介绍: Polymer Chemistry welcomes submissions in all areas of polymer science that have a strong focus on macromolecular chemistry. Manuscripts may cover a broad range of fields, yet no direct application focus is required.
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