Kevin J. García , José E. Santana , Álvaro Miranda , Alejandro Trejo , Fernando Salazar , Ivonne J. Hernández-Hernández , Luis A. Pérez , Miguel Cruz-Irisson
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引用次数: 0
Abstract
This study employs density functional theory (DFT) to explore the interaction between hydrogenated silicon nanowires (SiNW) and DNA/RNA nucleobases (adenine, cytosine, guanine, thymine, and uracil). We investigate various adsorption configurations (both perpendicular and parallel to the nanowire surface) to elucidate the adsorption energies, recovery times, charge transfers, and the consequent modifications in the electronic properties of the SiNW. Our findings reveal that, in most cases, the nucleobases chemisorb onto the SiNW surface with adsorption energies exceeding 0.5 eV, except for specific thymine configurations exhibiting lower binding. Notably, cytosine displays the highest adsorption energy, resulting in exceptionally long recovery times and significant charge redistribution indicative of strong covalent-like interactions. In contrast, adenine, guanine, and uracil exhibit lower adsorption energies and rapid desorption dynamics, suggesting their suitability for reusable sensor applications. Furthermore, the adsorption process induces considerable changes in the SiNW band structure, such as the formation of mid-gap states and shifts in the work function, thereby modulating the nanowire's electrical conductivity and optical properties. These results underscore the potential of SiNW as highly selective, label-free platforms for nucleobase detection and advanced DNA/RNA sequencing devices.
期刊介绍:
Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences.
A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below.
The scope of the journal includes:
1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes).
2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis.
3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification.
4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.