Design and performance analysis of the vacuum system for ion beam sputtering coating machine

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-04-26 DOI:10.1016/j.vacuum.2025.114372

Gengbiao Chen , Can Mo

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Abstract

A high-performance vacuum system is a critical component of an ion beam sputtering (IBS) coating machine, as a clean, high-vacuum environment is essential for ensuring the quality and uniformity of sputtered coatings. This paper presents the design and performance analysis of a vacuum system tailored for IBS processes. A dual-chamber structure optimized for sputtering operations is proposed, and simulation results confirm stable gas flow and the absence of dead zones during main pump operation. Appropriate pump types are selected, and a vacuum system layout is developed to meet the stringent vacuum requirements of the coating process. To achieve accurate prediction of the system's evacuation time, a segmented pumping speed correction factor is introduced, enabling the construction of a sectional vacuum pumping model. Furthermore, a set of synchronized equipment operation commands is devised to realize efficient and automated vacuum pumping. The experimental results of the automated process closely match the model predictions. Compared to existing machines of the same type, the proposed system achieves ultimate vacuum nearly 2 h faster.

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离子束溅射镀膜机真空系统的设计与性能分析

高性能真空系统是离子束溅射（IBS）镀膜机的关键组成部分，因为清洁的高真空环境对确保溅射涂层的质量和均匀性至关重要。本文介绍了一种适合IBS工艺的真空系统的设计和性能分析。提出了一种针对溅射作业优化的双腔结构，仿真结果表明主泵作业过程中气体流动稳定，无死区存在。选择合适的泵类型，并制定真空系统布局，以满足镀膜工艺的严格真空要求。为实现对系统抽真空时间的准确预测，引入分段抽真空速度校正因子，构建分段抽真空模型。设计了一套同步的设备运行指令，实现了高效、自动化的抽真空。自动化过程的实验结果与模型预测结果吻合较好。与现有的同类型机器相比，所提出的系统达到极限真空快了近2小时。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

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来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.