{"title":"ML-Based Prediction of Dual-Channel Core Gate Junctionless FET Device Parameters Using XGBoost","authors":"Rittik Kushwaha, Abhishek Raj, Shashi Kant Sharma","doi":"10.1002/jnm.70053","DOIUrl":null,"url":null,"abstract":"<div>\n \n <p>This study investigates the application of machine learning technique especially the ensemble learning category algorithm, that is, ‘Extreme Gradient Boosting (XGBoost)’ for making predictions of the various characteristics of Dual Channel Core Gate Junctionless Field Effect Transistors (DCCG-JLFET). Using data generated from the Technology Computer Aided Design (TCAD) simulations, the machine learning model is trained to predict the behavior of Dual Channel Core Gate Junctionless Field Effect Transistors based on various physical parameters. The objective of the model is to reveal the relationships and establish relationships among various parameters including drain current (<i>I</i><sub>DS</sub>) and various short channel effects like subthreshold slope (<i>SS</i>), threshold voltage (<i>V</i><sub>th</sub>), ON current (<i>I</i><sub>ON</sub>) and OFF current (<i>I</i><sub>OFF</sub>). Comparative analysis reveals that the ML model achieves an accuracy of 98.7% for current voltage curve prediction. Also, scatter plots reveal MSE of 5.96 × 10<sup>−9</sup> for <i>I</i><sub>DS</sub>, 6.98 × 10<sup>−8</sup> for <i>V</i><sub>th</sub>, 3.24 × 10<sup>−9</sup> for <i>I</i><sub>ON</sub>, 4.85 × 10<sup>−9</sup> for <i>I</i><sub>OFF</sub>, and 9.84 × 10<sup>−8</sup> for <i>SS</i> and RMSE of 7.72 × 10<sup>−5</sup> for <i>I</i><sub>DS</sub>, 2.64 × 10<sup>−4</sup> for <i>V</i><sub>th</sub>, 5.69 × 10<sup>−5</sup> for <i>I</i><sub>ON</sub>, 6.96 × 10<sup>−5</sup> for <i>I</i><sub>OFF</sub>, and 3.14 × 10<sup>−4</sup> for <i>SS</i> and <i>R</i><sup>2</sup>-score of 0.91 for <i>I</i><sub>DS</sub>, 0.99 for <i>V</i><sub>th</sub>, 0.96 for <i>I</i><sub>ON</sub>, 0.99 for <i>I</i><sub>OFF</sub>, and 0.97 for <i>SS</i> when compared to TCAD Simulations. This ML approach can be effectively applied in optimizing and designing semiconductor devices.</p>\n </div>","PeriodicalId":50300,"journal":{"name":"International Journal of Numerical Modelling-Electronic Networks Devices and Fields","volume":"38 3","pages":""},"PeriodicalIF":1.6000,"publicationDate":"2025-04-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Journal of Numerical Modelling-Electronic Networks Devices and Fields","FirstCategoryId":"5","ListUrlMain":"https://onlinelibrary.wiley.com/doi/10.1002/jnm.70053","RegionNum":4,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q3","JCRName":"ENGINEERING, ELECTRICAL & ELECTRONIC","Score":null,"Total":0}
引用次数: 0
Abstract
This study investigates the application of machine learning technique especially the ensemble learning category algorithm, that is, ‘Extreme Gradient Boosting (XGBoost)’ for making predictions of the various characteristics of Dual Channel Core Gate Junctionless Field Effect Transistors (DCCG-JLFET). Using data generated from the Technology Computer Aided Design (TCAD) simulations, the machine learning model is trained to predict the behavior of Dual Channel Core Gate Junctionless Field Effect Transistors based on various physical parameters. The objective of the model is to reveal the relationships and establish relationships among various parameters including drain current (IDS) and various short channel effects like subthreshold slope (SS), threshold voltage (Vth), ON current (ION) and OFF current (IOFF). Comparative analysis reveals that the ML model achieves an accuracy of 98.7% for current voltage curve prediction. Also, scatter plots reveal MSE of 5.96 × 10−9 for IDS, 6.98 × 10−8 for Vth, 3.24 × 10−9 for ION, 4.85 × 10−9 for IOFF, and 9.84 × 10−8 for SS and RMSE of 7.72 × 10−5 for IDS, 2.64 × 10−4 for Vth, 5.69 × 10−5 for ION, 6.96 × 10−5 for IOFF, and 3.14 × 10−4 for SS and R2-score of 0.91 for IDS, 0.99 for Vth, 0.96 for ION, 0.99 for IOFF, and 0.97 for SS when compared to TCAD Simulations. This ML approach can be effectively applied in optimizing and designing semiconductor devices.
期刊介绍:
Prediction through modelling forms the basis of engineering design. The computational power at the fingertips of the professional engineer is increasing enormously and techniques for computer simulation are changing rapidly. Engineers need models which relate to their design area and which are adaptable to new design concepts. They also need efficient and friendly ways of presenting, viewing and transmitting the data associated with their models.
The International Journal of Numerical Modelling: Electronic Networks, Devices and Fields provides a communication vehicle for numerical modelling methods and data preparation methods associated with electrical and electronic circuits and fields. It concentrates on numerical modelling rather than abstract numerical mathematics.
Contributions on numerical modelling will cover the entire subject of electrical and electronic engineering. They will range from electrical distribution networks to integrated circuits on VLSI design, and from static electric and magnetic fields through microwaves to optical design. They will also include the use of electrical networks as a modelling medium.