ML-Based Prediction of Dual-Channel Core Gate Junctionless FET Device Parameters Using XGBoost

IF 1.6 4区 工程技术 Q3 ENGINEERING, ELECTRICAL & ELECTRONIC
Rittik Kushwaha, Abhishek Raj, Shashi Kant Sharma
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引用次数: 0

Abstract

This study investigates the application of machine learning technique especially the ensemble learning category algorithm, that is, ‘Extreme Gradient Boosting (XGBoost)’ for making predictions of the various characteristics of Dual Channel Core Gate Junctionless Field Effect Transistors (DCCG-JLFET). Using data generated from the Technology Computer Aided Design (TCAD) simulations, the machine learning model is trained to predict the behavior of Dual Channel Core Gate Junctionless Field Effect Transistors based on various physical parameters. The objective of the model is to reveal the relationships and establish relationships among various parameters including drain current (IDS) and various short channel effects like subthreshold slope (SS), threshold voltage (Vth), ON current (ION) and OFF current (IOFF). Comparative analysis reveals that the ML model achieves an accuracy of 98.7% for current voltage curve prediction. Also, scatter plots reveal MSE of 5.96 × 10−9 for IDS, 6.98 × 10−8 for Vth, 3.24 × 10−9 for ION, 4.85 × 10−9 for IOFF, and 9.84 × 10−8 for SS and RMSE of 7.72 × 10−5 for IDS, 2.64 × 10−4 for Vth, 5.69 × 10−5 for ION, 6.96 × 10−5 for IOFF, and 3.14 × 10−4 for SS and R2-score of 0.91 for IDS, 0.99 for Vth, 0.96 for ION, 0.99 for IOFF, and 0.97 for SS when compared to TCAD Simulations. This ML approach can be effectively applied in optimizing and designing semiconductor devices.

基于ml的XGBoost双通道核栅无结FET器件参数预测
本研究探讨了机器学习技术的应用,特别是集成学习分类算法,即“极限梯度增强(XGBoost)”,用于预测双通道栅极无结场效应晶体管(DCCG-JLFET)的各种特性。利用技术计算机辅助设计(TCAD)仿真生成的数据,训练机器学习模型来预测基于各种物理参数的双通道栅极无结场效应晶体管的行为。该模型的目的是揭示和建立漏极电流(IDS)与亚阈值斜率(SS)、阈值电压(Vth)、接通电流(ION)和断开电流(IOFF)等各种短通道效应之间的关系。对比分析表明,ML模型对电流电压曲线的预测精度达到了98.7%。同时,散点图揭示MSE为IDS 5.96×10−9,6.98×10−Vth 8, 3.24×10−9离子,4.85×10−IOFF 9,和9.84×10−8 SS和RMSE IDS 7.72×10−5,2.64×10−4 Vth, 5.69×10−5离子,6.96×10−5 IOFF,和3.14×10−4 SS和R2-score IDS 0.91, 0.99 Vth, 0.96离子,IOFF 0.99, 0.97 SS TCAD仿真相比。这种机器学习方法可以有效地应用于半导体器件的优化设计。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
4.60
自引率
6.20%
发文量
101
审稿时长
>12 weeks
期刊介绍: Prediction through modelling forms the basis of engineering design. The computational power at the fingertips of the professional engineer is increasing enormously and techniques for computer simulation are changing rapidly. Engineers need models which relate to their design area and which are adaptable to new design concepts. They also need efficient and friendly ways of presenting, viewing and transmitting the data associated with their models. The International Journal of Numerical Modelling: Electronic Networks, Devices and Fields provides a communication vehicle for numerical modelling methods and data preparation methods associated with electrical and electronic circuits and fields. It concentrates on numerical modelling rather than abstract numerical mathematics. Contributions on numerical modelling will cover the entire subject of electrical and electronic engineering. They will range from electrical distribution networks to integrated circuits on VLSI design, and from static electric and magnetic fields through microwaves to optical design. They will also include the use of electrical networks as a modelling medium.
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