{"title":"On Using nMOS-pMOS-Type Cells in a Threshold-Voltage Compensated CMOS RF-DC Rectifier","authors":"Yoomi Park;Sangjin Byun","doi":"10.1109/TVLSI.2024.3515110","DOIUrl":null,"url":null,"abstract":"In this brief, we discuss the merits of using nMOS-pMOS (NP)-type cells instead of nMOS-nMOS (NN)- or pMOS-pMOS (PP)-type cells in a single-ended, threshold-voltage compensated CMOS RF-dc rectifier. By adopting the NP-type cells, we can avoid the degradation of the generated output dc voltage due to parasitic long interconnection wire capacitance, deep N-well to P-substrate junction capacitance, and additional body effect. For comparison, we have implemented two RF-dc rectifiers in a 28-nm 1P11M CMOS process. The measured results show that the implemented RF-dc rectifier with the NP-type cells achieves 0.7-dB higher input power sensitivity and <inline-formula> <tex-math>$3\\times $ </tex-math></inline-formula> faster recharging time than the other rectifier with the NN-type cells.","PeriodicalId":13425,"journal":{"name":"IEEE Transactions on Very Large Scale Integration (VLSI) Systems","volume":"33 5","pages":"1472-1476"},"PeriodicalIF":2.8000,"publicationDate":"2024-12-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Very Large Scale Integration (VLSI) Systems","FirstCategoryId":"5","ListUrlMain":"https://ieeexplore.ieee.org/document/10814714/","RegionNum":2,"RegionCategory":"工程技术","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"COMPUTER SCIENCE, HARDWARE & ARCHITECTURE","Score":null,"Total":0}
引用次数: 0
Abstract
In this brief, we discuss the merits of using nMOS-pMOS (NP)-type cells instead of nMOS-nMOS (NN)- or pMOS-pMOS (PP)-type cells in a single-ended, threshold-voltage compensated CMOS RF-dc rectifier. By adopting the NP-type cells, we can avoid the degradation of the generated output dc voltage due to parasitic long interconnection wire capacitance, deep N-well to P-substrate junction capacitance, and additional body effect. For comparison, we have implemented two RF-dc rectifiers in a 28-nm 1P11M CMOS process. The measured results show that the implemented RF-dc rectifier with the NP-type cells achieves 0.7-dB higher input power sensitivity and $3\times $ faster recharging time than the other rectifier with the NN-type cells.
期刊介绍:
The IEEE Transactions on VLSI Systems is published as a monthly journal under the co-sponsorship of the IEEE Circuits and Systems Society, the IEEE Computer Society, and the IEEE Solid-State Circuits Society.
Design and realization of microelectronic systems using VLSI/ULSI technologies require close collaboration among scientists and engineers in the fields of systems architecture, logic and circuit design, chips and wafer fabrication, packaging, testing and systems applications. Generation of specifications, design and verification must be performed at all abstraction levels, including the system, register-transfer, logic, circuit, transistor and process levels.
To address this critical area through a common forum, the IEEE Transactions on VLSI Systems have been founded. The editorial board, consisting of international experts, invites original papers which emphasize and merit the novel systems integration aspects of microelectronic systems including interactions among systems design and partitioning, logic and memory design, digital and analog circuit design, layout synthesis, CAD tools, chips and wafer fabrication, testing and packaging, and systems level qualification. Thus, the coverage of these Transactions will focus on VLSI/ULSI microelectronic systems integration.