Simulation of yttria hot cathode and radiative emissivity impact on its performances and the work function measurement

IF 3.8 2区材料科学 Q2 MATERIALS SCIENCE, MULTIDISCIPLINARY

Vacuum Pub Date : 2025-04-23 DOI:10.1016/j.vacuum.2025.114363

Audrey Mayrat , Quentin Rafhay , Claire Verrier , Jean-Luc Deschanvres

引用次数: 0

Abstract

—Despite the decline in their use after the advent of semiconductor devices, hot cathodes still find applications in specialized detectors and high-power systems. This paper focuses on the simulation of the thermal behavior of an oxide cathode (Y₂O₃), considering the variation in emissivity as a function of both material and temperature. Most previous studies on hot cathodes have overlooked the importance of radiative emissivity, a parameter that significantly affects thermal exchange, electronic emission and hence the measurement of the work function with a Richardson plot. Our results emphasize the need for a precise measurement of material emissivity to accurately assess cathode performance and enable fair comparisons between different cathode types.

查看原文本刊更多论文

钇热阴极模拟及辐射发射率对其性能和功函数测量的影响

尽管在半导体器件出现后，热阴极的使用有所减少，但热阴极仍然在专门的探测器和大功率系统中得到应用。本文着重于模拟氧化阴极（Y2O3）的热行为，考虑发射率的变化作为材料和温度的函数。以前对热阴极的大多数研究都忽略了辐射发射率的重要性，辐射发射率是一个显著影响热交换、电子发射以及用理查德森图测量功函数的参数。我们的结果强调需要精确测量材料发射率，以准确评估阴极性能，并使不同阴极类型之间的公平比较。

本文章由计算机程序翻译，如有差异，请以英文原文为准。

求助全文

约1分钟内获得全文求助全文

来源期刊

Vacuum 工程技术-材料科学：综合

CiteScore

6.80

自引率

17.50%

发文量

审稿时长

34 days

期刊介绍： Vacuum is an international rapid publications journal with a focus on short communication. All papers are peer-reviewed, with the review process for short communication geared towards very fast turnaround times. The journal also published full research papers, thematic issues and selected papers from leading conferences. A report in Vacuum should represent a major advance in an area that involves a controlled environment at pressures of one atmosphere or below. The scope of the journal includes: 1. Vacuum; original developments in vacuum pumping and instrumentation, vacuum measurement, vacuum gas dynamics, gas-surface interactions, surface treatment for UHV applications and low outgassing, vacuum melting, sintering, and vacuum metrology. Technology and solutions for large-scale facilities (e.g., particle accelerators and fusion devices). New instrumentation ( e.g., detectors and electron microscopes). 2. Plasma science; advances in PVD, CVD, plasma-assisted CVD, ion sources, deposition processes and analysis. 3. Surface science; surface engineering, surface chemistry, surface analysis, crystal growth, ion-surface interactions and etching, nanometer-scale processing, surface modification. 4. Materials science; novel functional or structural materials. Metals, ceramics, and polymers. Experiments, simulations, and modelling for understanding structure-property relationships. Thin films and coatings. Nanostructures and ion implantation.