Optical and structural characterization of SILAR-coated Mn-doped ZnS films for LEDs

IF 2.8 4区 工程技术 Q2 ENGINEERING, ELECTRICAL & ELECTRONIC
Emmanuel Tom, P. V. Jithin, Abhijai Velluva, Sijo Arackal Kuriakose, Mithra Geetha, Kishor Kumar Sadasivuni, M. V. Ajith, K. Rhithulraj, Joji Kurian
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Abstract

This study explores the structural and optical properties of Zn1-xMnxS thin films, with varying Mn content (x) between 0 and 0.07. These films are meticulously fabricated on glass substrates using the successive ionic layer adsorption and reaction method. The results confirm the polycrystalline nature of these samples, revealing their crystallization in a cubic phase with the Fm-3 m space group, and providing insights into their fundamental structural makeup. Notably, these films possess a nanocrystalline character, with grain sizes ranging from 2.7 to 2.1 nm, indicating a finely textured structure at the nanoscale. The optical band gap energy, determined using Tauc's plot method, ranges from 3.53 to 3.56 eV. In the realm of optics, the study unveils that the incorporation of manganese dopant has minimal impact on the optical band gap energy, showing only minor fluctuations. This makes Mn-doped ZnS a promising material for optoelectronic applications due to its minimal absorption losses in the visible spectrum. Additionally, the research uncovers vital details about defect levels, including cation and anion vacancies, obtained through photoluminescence measurements. These defects have the potential to significantly influence the material’s electronic properties and its suitability for various applications. The utilization of a chromaticity diagram in the study elucidates the promising potential of this engineered material within the semiconductor sector, especially in the context of light-emitting diode (LED) technology, where its efficient light-emitting properties are poised to make a substantial contribution.

用于led的silar涂层mn掺杂ZnS薄膜的光学和结构表征
本研究探讨了Mn含量(x)在0 ~ 0.07之间变化时Zn1-xMnxS薄膜的结构和光学性质。这些薄膜是采用连续离子层吸附和反应方法在玻璃衬底上精心制备的。结果证实了这些样品的多晶性质,揭示了它们在立方相中与fm - 3m空间群的结晶,并提供了对其基本结构组成的见解。值得注意的是,这些薄膜具有纳米晶的特征,晶粒尺寸在2.7到2.1 nm之间,表明在纳米尺度上具有精细的纹理结构。利用Tauc图法测定的光学带隙能量范围为3.53 ~ 3.56 eV。在光学领域,该研究揭示了锰掺杂对光学带隙能量的影响最小,仅显示出微小的波动。这使得mn掺杂ZnS由于其在可见光谱中的最小吸收损失而成为光电子应用的有前途的材料。此外,该研究还揭示了通过光致发光测量获得的有关缺陷水平的重要细节,包括阳离子和阴离子空位。这些缺陷有可能显著影响材料的电子性能及其在各种应用中的适用性。色度图在研究中的应用阐明了这种工程材料在半导体领域的巨大潜力,特别是在发光二极管(LED)技术的背景下,其高效的发光特性将做出重大贡献。
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来源期刊
Journal of Materials Science: Materials in Electronics
Journal of Materials Science: Materials in Electronics 工程技术-材料科学:综合
CiteScore
5.00
自引率
7.10%
发文量
1931
审稿时长
2 months
期刊介绍: The Journal of Materials Science: Materials in Electronics is an established refereed companion to the Journal of Materials Science. It publishes papers on materials and their applications in modern electronics, covering the ground between fundamental science, such as semiconductor physics, and work concerned specifically with applications. It explores the growth and preparation of new materials, as well as their processing, fabrication, bonding and encapsulation, together with the reliability, failure analysis, quality assurance and characterization related to the whole range of applications in electronics. The Journal presents papers in newly developing fields such as low dimensional structures and devices, optoelectronics including III-V compounds, glasses and linear/non-linear crystal materials and lasers, high Tc superconductors, conducting polymers, thick film materials and new contact technologies, as well as the established electronics device and circuit materials.
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