Label-free biosensor with multidimensional aspects of a molybdenum di-sulfide dual-gate Schottky tunnel field-effect transistor (D-G-STFET)

IF 2.7 Q2 PHYSICS, CONDENSED MATTER
Anusuya Periyasami , Prashanth Kumar
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引用次数: 0

Abstract

In this research, we presented a simulation of a MoS2-based dual-gate Schottky barrier tunnel field-effect transistor (D-G-STFET) with high-k dielectric (TiO2), emerging as a promising device for detecting biomolecules. The source and drain regions consist of metals selected based on their work functions. Furthermore, the channel is made of MoS2, with zirconium as the gate material, to enhance D-G-STFET biosensor performance. Using dual cavities etched beneath the dual gate electrode of the biosensor promotes biomolecule immobilization. Moreover, biomolecule immobilization, along with their charge density and dielectric constant (k), collectively alters the effective dielectric constant of the gate oxide. Which leads to changes in surface potential and drain current, ultimately determining the sensitivity of the biomolecules. We characterized the MoS2 effect on the proposed biosensor device in terms of drain current, potential, electric field, conduction and valence band energy, and sensitivity of charged and neutral biomolecules. Additionally, we analyzed the influence of temperature on the proposed and conventional devices. Here, the proposed device shows superior performance than the silicon and GaN material of conventional devices. Proposed and conventional device simulations are calculated using SILVACO TCAD tool.
双硫化钼双栅肖特基隧道场效应晶体管(D-G-STFET)多维面无标签生物传感器
在这项研究中,我们提出了一种基于mos2的双栅极肖特基势垒隧道场效应晶体管(D-G-STFET)的高k介电介质(TiO2)的模拟,这是一种很有前途的检测生物分子的装置。源区和漏区由根据其工作功能选择的金属组成。此外,该通道由二硫化钼制成,锆作为栅极材料,以提高D-G-STFET生物传感器的性能。利用双腔蚀刻在生物传感器的双栅电极下,促进生物分子的固定。此外,生物分子固定化及其电荷密度和介电常数(k)共同改变栅极氧化物的有效介电常数。这会导致表面电位和漏极电流的变化,最终决定生物分子的灵敏度。我们从漏极电流、电势、电场、电导率和价带能以及带电和中性生物分子的灵敏度等方面表征了MoS2对所提出的生物传感器器件的影响。此外,我们还分析了温度对所提出器件和常规器件的影响。在这里,所提出的器件表现出优于传统器件的硅和GaN材料的性能。采用SILVACO TCAD工具对提出的和传统的器件进行了仿真计算。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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来源期刊
CiteScore
6.50
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0.00%
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