Raul Zazpe, Jaroslav Charvot, Jhonatan Rodriguez-Pereira, Ludek Hromadko, Michal Kurka, Kaushik Baishya, Hanna Sopha, Filip Bureš, Jan M. Macak
{"title":"Synthesis of titanium phosphide by thermal ALD based on a novel phosphorous precursor","authors":"Raul Zazpe, Jaroslav Charvot, Jhonatan Rodriguez-Pereira, Ludek Hromadko, Michal Kurka, Kaushik Baishya, Hanna Sopha, Filip Bureš, Jan M. Macak","doi":"10.1039/d5nr00457h","DOIUrl":null,"url":null,"abstract":"Herein, we present for the first time the synthesis of Titanium Phosphide (TixPy) by thermal ALD based on the use of in-house synthesized Tris(trimethyltin)phosphide (TMT3P) combined with Titanium Tetrachloride (TiCl4) as the P- and Ti-precursor, respectively. The deposition process demonstrated followed ALD principles and revealed an ALD window between 175 °C and 225 °C. The TixPy thin films grown on substrates of different nature were characterized by several techniques, showing granular surface and electrical resistivities of the order of hundreds of Ohms. The effect of different ALD parameters such as, deposition temperature, dosing time of both precursors, and the type of substrate on the chemical composition was extensively assessed by X-ray photoelectron spectroscopy (XPS). Interestingly, the results yielded the deposition of P-rich Titanium Phosphide and showed that its chemical composition depends on the deposition temperature and the type of substrate. Based on XPS results, a tentative description of the TixPy growth as a function of the number of ALD cycles was provided.","PeriodicalId":92,"journal":{"name":"Nanoscale","volume":"18 1","pages":""},"PeriodicalIF":5.8000,"publicationDate":"2025-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Nanoscale","FirstCategoryId":"88","ListUrlMain":"https://doi.org/10.1039/d5nr00457h","RegionNum":3,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q1","JCRName":"CHEMISTRY, MULTIDISCIPLINARY","Score":null,"Total":0}
引用次数: 0
Abstract
Herein, we present for the first time the synthesis of Titanium Phosphide (TixPy) by thermal ALD based on the use of in-house synthesized Tris(trimethyltin)phosphide (TMT3P) combined with Titanium Tetrachloride (TiCl4) as the P- and Ti-precursor, respectively. The deposition process demonstrated followed ALD principles and revealed an ALD window between 175 °C and 225 °C. The TixPy thin films grown on substrates of different nature were characterized by several techniques, showing granular surface and electrical resistivities of the order of hundreds of Ohms. The effect of different ALD parameters such as, deposition temperature, dosing time of both precursors, and the type of substrate on the chemical composition was extensively assessed by X-ray photoelectron spectroscopy (XPS). Interestingly, the results yielded the deposition of P-rich Titanium Phosphide and showed that its chemical composition depends on the deposition temperature and the type of substrate. Based on XPS results, a tentative description of the TixPy growth as a function of the number of ALD cycles was provided.
期刊介绍:
Nanoscale is a high-impact international journal, publishing high-quality research across nanoscience and nanotechnology. Nanoscale publishes a full mix of research articles on experimental and theoretical work, including reviews, communications, and full papers.Highly interdisciplinary, this journal appeals to scientists, researchers and professionals interested in nanoscience and nanotechnology, quantum materials and quantum technology, including the areas of physics, chemistry, biology, medicine, materials, energy/environment, information technology, detection science, healthcare and drug discovery, and electronics.