Ziyang Yu;Su Zheng;Wenqian Zhao;Shuo Yin;Xiaoxiao Liang;Guojin Chen;Yuzhe Ma;Bei Yu;Martin D. F. Wong
{"title":"RuleLearner: OPC Rule Extraction From Inverse Lithography Technique Engine","authors":"Ziyang Yu;Su Zheng;Wenqian Zhao;Shuo Yin;Xiaoxiao Liang;Guojin Chen;Yuzhe Ma;Bei Yu;Martin D. F. Wong","doi":"10.1109/TCAD.2024.3499909","DOIUrl":null,"url":null,"abstract":"Model-based optical proximity correction (OPC) with subresolution assist feature (SRAF) generation is a critical standard practice for compensating lithography distortions in the fabrication of integrated circuits at advanced technology nodes. Typical model-based OPC and SRAF algorithms involve the selection of user-controlled rule parameters. Conventionally, these rules are heuristically determined and applied globally throughout the correction regions, which can be time consuming and require expert knowledge of the tool. Additionally, the correlations of rule parameters to the objectives are highly nonlinear. All these factors make designing a high-performance OPC engine for complex metal designs a nontrivial task. This article proposes RuleLearner, a comprehensive mask optimization system designed for SRAF generation and model-based OPC in real industrial scenarios. The proposed framework learns from the guidance of an information-augmented inverse lithography technique engine, which, although expressive for complex designs, is expensive to generate refined masks for a whole set of design clips. Considering the nonlinearity and the tradeoff between local and global performance, the extracted rule value distributions are further optimized with customized natural gradients. The sophisticated SRAF generation, the edge segmentation and movements are then guided by the rule parameter. Experimental results show that RuleLearner can be applied across different complex design patterns and achieve the best lithographic performance and computational efficiency.","PeriodicalId":13251,"journal":{"name":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","volume":"44 5","pages":"1915-1927"},"PeriodicalIF":2.7000,"publicationDate":"2024-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems","FirstCategoryId":"94","ListUrlMain":"https://ieeexplore.ieee.org/document/10753456/","RegionNum":3,"RegionCategory":"计算机科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"Q2","JCRName":"COMPUTER SCIENCE, HARDWARE & ARCHITECTURE","Score":null,"Total":0}
引用次数: 0
Abstract
Model-based optical proximity correction (OPC) with subresolution assist feature (SRAF) generation is a critical standard practice for compensating lithography distortions in the fabrication of integrated circuits at advanced technology nodes. Typical model-based OPC and SRAF algorithms involve the selection of user-controlled rule parameters. Conventionally, these rules are heuristically determined and applied globally throughout the correction regions, which can be time consuming and require expert knowledge of the tool. Additionally, the correlations of rule parameters to the objectives are highly nonlinear. All these factors make designing a high-performance OPC engine for complex metal designs a nontrivial task. This article proposes RuleLearner, a comprehensive mask optimization system designed for SRAF generation and model-based OPC in real industrial scenarios. The proposed framework learns from the guidance of an information-augmented inverse lithography technique engine, which, although expressive for complex designs, is expensive to generate refined masks for a whole set of design clips. Considering the nonlinearity and the tradeoff between local and global performance, the extracted rule value distributions are further optimized with customized natural gradients. The sophisticated SRAF generation, the edge segmentation and movements are then guided by the rule parameter. Experimental results show that RuleLearner can be applied across different complex design patterns and achieve the best lithographic performance and computational efficiency.
期刊介绍:
The purpose of this Transactions is to publish papers of interest to individuals in the area of computer-aided design of integrated circuits and systems composed of analog, digital, mixed-signal, optical, or microwave components. The aids include methods, models, algorithms, and man-machine interfaces for system-level, physical and logical design including: planning, synthesis, partitioning, modeling, simulation, layout, verification, testing, hardware-software co-design and documentation of integrated circuit and system designs of all complexities. Design tools and techniques for evaluating and designing integrated circuits and systems for metrics such as performance, power, reliability, testability, and security are a focus.